Chemical Formula: Cu/Al
Catalog Number: ST0083
CAS Number: 7440-50-8 | 7429
Purity: 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
The copper aluminum sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality copper aluminum sputter targets at the most competitive prices.
The copper aluminum sputtering target is made of high-quality copper aluminum alloys. Copper aluminum alloys are most valued for their higher strength and corrosion resistance as compared to other bronze alloys. These alloys are tarnish-resistant and show low rates of corrosion in atmospheric conditions, low oxidation rates at high temperatures, and low reactivity with sulfurous compounds and other exhaust products of combustion. They are also resistant to corrosion in seawater. Copper aluminum alloy’s resistance to corrosion results from the aluminum in the alloys, which reacts with atmospheric oxygen to form a thin, tough surface layer of alumina (aluminum oxide) which acts as a barrier to corrosion of the copper-rich alloy.
Related Product: Copper Sputtering Target, Aluminum Sputtering Target
Our copper aluminum sputtering targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
SAM’s copper aluminum sputtering targets are available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for the current prices of sputtering targets and other deposition materials that are not listed.
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Wow! What a great purchase! This pack should last me a long time! Recommended!
