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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0081 Cobalt Titanium Sputtering Target, Co/Ti

Chemical Formula: Co/Ti
Catalog Number: ST0081
CAS Number: 7440-48-4 | 7440
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Cobalt titanium sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality cobalt titanium sputter target at the most competitive price.




Description

Cobalt Titanium Sputtering Target Description

Cobalt titanium sputtering target from Stanford Advanced Materials is a silvery alloy sputtering material containing Co and Ti.

CobaltCobalt is a chemical element that originated from the German word ‘kobald’, meaning goblin. It was first mentioned in 1732 and observed by G. Brandt. “Co” is the canonical chemical symbol of cobalt. Its atomic number in the periodic table of elements is 27 with a location at Period 4 and Group 9, belonging to the d-block. The relative atomic mass of cobalt is 58.933195(5) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Cobalt Sputtering Target

TitaniumTitanium is a chemical element originated from Titans, the sons of the Earth goddess of Greek mythology. It was first mentioned in 1791 and observed by W. Gregor. The isolation was later accomplished and announced by J. Berzelius. “Ti” is the canonical chemical symbol of titanium. Its atomic number in the periodic table of elements is 22 with a location at Period 4 and Group 4, belonging to the d-block. The relative atomic mass of titanium is 47.867(1) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Titanium Sputtering Target

Cobalt Titanium Sputtering Target Packaging

Our cobalt titanium sputtering targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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SAM’s cobalt titanium sputtering targets are available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for the current prices of sputtering targets and other deposition materials that are not listed.

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Cobalt Titanium Sputtering Target, Co/Ti
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