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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0078 Cobalt Iron Sputtering Target, Co/Fe

Chemical Formula: Co/Fe
Catalog Number: ST0078
CAS Number: 12052-28-7
Purity: 99.9%, 99.95%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

The cobalt iron sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality cobalt iron sputter target at the most competitive price.




Description

Cobalt Iron Sputtering Target Description

Cobalt iron sputtering target from Stanford Advanced Materials is an alloy sputtering material containing Co and Fe.

Cobalt

Cobalt is a chemical element that originated from the German word ‘kobald’, meaning goblin. It was first mentioned in 1732 and observed by G. Brandt. “Co” is the canonical chemical symbol of cobalt. Its atomic number in the periodic table of elements is 27 with a location at Period 4 and Group 9, belonging to the d-block. The relative atomic mass of cobalt is 58.933195(5) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Cobalt Sputtering Target

ironIron, also called ferrum, is a chemical element that originated from the Anglo-Saxon name iren (ferrum in Latin). It was early used before 5000 BC. “Fe” is the canonical chemical symbol of iron. Its atomic number in the periodic table of elements is 26 with a location at Period 4 and Group 8, belonging to the d-block. The relative atomic mass of iron is 55.845(2) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Iron Sputtering Target

Cobalt Iron Sputtering Target Packaging

Our cobalt iron sputtering targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Get Contact

SAM’s cobalt iron sputtering targets are available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for the current prices of sputtering targets and other deposition materials that are not listed.

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Cobalt Iron Sputtering Target, Co/Fe
Average rating:  
 1 reviews
by Carol Anderson on Cobalt Iron Sputtering Target, Co/Fe

I bought these for chemistry class to do some film coating experiments with. They function properly for what we use them for.