Chemical Formula: Co
Catalog Number: ST0010
CAS Number: 7440-48-4
Purity: >99.95%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Cobalt sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is your one-stop source to find cobalt sputter targets for sale.
Cobalt sputtering target has the same properties as the metal cobalt. 
Cobalt is a chemical element originated from the German word ‘kobald’, meaning goblin. It was first mentioned in 1732 and observed by G. Brandt. “Co” is the canonical chemical symbol of cobalt. Its atomic number in the periodic table of elements is 27 with location at Period 4 and Group 9, belonging to the d-block. The relative atomic mass of cobalt is 58.933195(5) Dalton, the number in the brackets indicating the uncertainty.
One of its most popular uses is as a blue pigment found in paint, jewelry, and glass. Cobalt is often alloyed with other metals to make engine parts and cutting tools. Its two main vacuum applications are as a ferromagnetic layer in the production of magnetic storage media and as a transitional layer in battery fabrication.
| Material Type | Cobalt |
| Symbol | Co |
| Color/Appearance | Lustrous, Metallic, Grayish Tinge |
| Melting Point | 1,495 °C |
| Thermal Conductivity | 100 W/m.K |
| Density | 8.9 g/cc |
| Sputter | DC |
| Coefficient of Thermal Expansion | 13.0 x 10-6/K |
| Comments | Alloys with W/Ta/Mo |
| Available Sizes | Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
Indium Bonding and Elastomer Bonding are recommended for the cobalt sputtering target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
The cobalt sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM’s cobalt sputtering targets are available in various forms, purities, sizes, and prices. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
Submit your review | |
I bought these for chemistry class to do some film coating experiments with. They function properly for what we use them for.
