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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0080 Cobalt Nickel Sputtering Target, Co/Ni

Chemical Formula: Co/Ni
Catalog Number: ST0080
CAS Number: 7440-48-4 | 7440
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Cobalt nickel sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality cobalt nickel sputter target at the most competitive price.




Description

Cobalt Nickel Sputtering Target Description

Cobalt nickel sputtering target from Stanford Advanced Materials is a silvery alloy sputtering material containing Co and Cr.

CobaltCobalt is a chemical element originated from the German word ‘kobald’, meaning goblin. It was first mentioned in 1732 and observed by G. Brandt. “Co” is the canonical chemical symbol of cobalt. Its atomic number in the periodic table of elements is 27 with location at Period 4 and Group 9, belonging to the d-block. The relative atomic mass of cobalt is 58.933195(5) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Cobalt Sputtering Target

NickelNickel is a chemical element originated from the shortened of the German ‘kupfernickel’ meaning either devil’s copper or St. Nicholas’s copper. It was first mentioned in 1751 and observed by F. Cronstedt. The isolation was later accomplished and announced by F. Cronstedt. “Ni” is the canonical chemical symbol of nickel. Its atomic number in the periodic table of elements is 28 with location at Period 4 and Group 10, belonging to the d-block. The relative atomic mass of nickel is 58.6934(2) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Nickel Sputtering Target

Cobalt Nickel Sputtering Target Packaging

Our cobalt nickel sputtering targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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SAM’s cobalt nickel sputtering targets are available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for the current prices of sputtering targets and other deposition materials that are not listed.

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Cobalt Nickel Sputtering Target, Co/Ni
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