Chemical Formula: TaTe2
Catalog Number: ST0329
CAS Number: 12067-66-2
Purity: 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Tantalum telluride sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high quality TaTe2 sputtering targets at the most competitive price.
Tantalum telluride sputtering target is a type of telluride ceramic sputtering target composed of tantalum and tellurium.
Tantalum is a chemical element originated from King Tantalus, father of Niobe from Greek mythology. It was first mentioned in 1802 and observed by G. Ekeberg. “Ta” is the canonical chemical symbol of tantalum. Its atomic number in the periodic table of elements is 73 with location at Period 6 and Group 5, belonging to the d-block. The relative atomic mass of tantalum is 180.94788(2) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Tantalum Sputtering Target
Tellurium is a chemical element originated from Earth, the third planet on solar system (with the Latin word tellus). It was first mentioned in 1782 and observed by F.-J.M. von Reichenstein. The isolation was later accomplished and announced by H. Klaproth. “Te” is the canonical chemical symbol of tellurium. Its atomic number in the periodic table of elements is 52 with location at Period 5 and Group 16, belonging to the p-block. The relative atomic mass of tellurium is 127.60(3) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Telluride Ceramic Sputtering Target
The tantalum telluride sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our tantalum telluride sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM’s tantalum telluride sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for the current pricing of sputtering targets and other deposition materials that are not listed.
Submit your review
Individually boxed and shipped nicely. Will buy them from SAM again.