Chemical Formula: TaSi2
Catalog Number: ST0267
CAS Number: 12039-79-1
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Tantalum silicide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high quality TaSi2 sputtering targets at the most competitive price.
Tantalum silicide sputtering target is a type of silicide ceramic sputtering target composed of tantalum and silicon.
Tantalum is a chemical element originated from King Tantalus, father of Niobe from Greek mythology. It was first mentioned in 1802 and observed by G. Ekeberg. “Ta” is the canonical chemical symbol of tantalum. Its atomic number in the periodic table of elements is 73 with location at Period 6 and Group 5, belonging to the d-block. The relative atomic mass of tantalum is 180.94788(2) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Tantalum Sputtering Target
Silicon is a chemical element originated from the Latin ‘silex’ or ‘silicis’, meaning flint. It was first mentioned in 1824 and observed by J. Berzelius. The isolation was later accomplished and announced by J. Berzelius. “Si” is the canonical chemical symbol of silicon. Its atomic number in the periodic table of elements is 14 with location at Period 3 and Group 14, belonging to the p-block. The relative atomic mass of silicon is 28.0855(3) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Silicide Ceramic Sputtering Target
The tantalum silicide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our tantalum silicide sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM’s tantalum silicide sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for the current prices of sputtering targets and other deposition materials that are not listed.