ST11219 Zinc (Zn) Planar Sputtering Target

Complete Technical Specifications & Capabilities

Comprehensive specifications for sputtering zinc films and reactive deposition of zinc oxide.

Technical & Application Deep Dive

1. The Gateway to Zinc Oxide (ZnO): A Multifunctional Semiconductor

The primary use of high-purity zinc targets is for reactive sputtering of ZnO, a material with exceptional versatility:

• Transparent Conductive Oxides (TCOs): When doped with aluminum (Al), ZnO becomes aluminum-doped zinc oxide (AZO)—a highly transparent, conductive, and cost-effective alternative to indium tin oxide (ITO) for solar cells, flat-panel displays, and touch screens.
• Piezoelectric Devices: ZnO’s strong piezoelectric properties make it ideal for surface acoustic wave (SAW) filters, sensors, and micro-electromechanical systems (MEMS).
• UV Optoelectronics: With a direct bandgap of ~3.37 eV, ZnO is used in UV LEDs, detectors, and lasers.
• Buffer Layers in Thin-Film Photovoltaics: Used in CIGS and perovskite solar cells to improve interface properties and device efficiency.

2. Pure Zinc Films: Functional Coatings and Alloying

Metallic zinc films also serve important purposes:

• Sacrificial Anti-Corrosion Coatings: Zinc acts as a sacrificial anode, providing galvanic protection to steel and other metals. Sputtered zinc films offer a uniform, controlled alternative to hot-dip galvanizing for precision components.
• Seed Layers for Nanostructures: Thin zinc films serve as catalysts or seed layers for the subsequent growth of ZnO nanowires or nanostructures via thermal oxidation or other methods.
• Alloying Component: Used in co-sputtering to create zinc-containing alloys (e.g., brass, Zn-Sn, Zn-Mg) for specialized coating applications.
• Dopant Source: In III-V semiconductor manufacturing, zinc is a common p-type dopant; sputtering from a Zn target can be used for doping during epitaxial growth.

3. Sputtering Process Considerations for Zinc

Sputtering zinc requires attention to its specific material properties:

• Low Melting Point: Requires careful control of sputtering power and target cooling to prevent localized melting or thermal runaway.
• High Deposition Rate: Zinc’s high sputtering yield allows for high deposition rates, improving coating throughput.
• Reactive Sputtering for ZnO: Adding oxygen to the sputtering gas allows for the deposition of stoichiometric or oxygen-deficient ZnO films. Process control is key to obtaining the desired optical and electrical properties.
• Oxidation Sensitivity: Pure zinc targets must be handled and stored to minimize surface oxidation, which can affect initial sputtering stability.

Quality Assurance & Manufacturing

Stanford Advanced Materials ensures the highest quality for zinc targets:

• High-Purity Production: Raw materials are refined to 4N (99.99%) purity or higher, with trace element analysis via Glow Discharge Mass Spectrometry (GDMS).
• Oxidation Control: Manufacturing and final machining are performed in controlled atmospheres or with coolant systems that minimize oxide formation on the target surface.
• Dimensional Accuracy: Precision machining ensures flatness and dimensional tolerances required for proper thermal contact and even erosion in the sputtering system.
• Protective Packaging: Targets are sealed with desiccants or under inert gas to preserve surface quality during shipping and storage.

Why Choose SAM for Your Zinc Targets?

• Optoelectronics & PV Focus: We specialize in high-purity materials for transparent conductive oxides and photovoltaic applications, understanding the critical link between target purity and film performance.
• Superior Purity Control: Our 4N standard purity ensures low contamination levels for high-performance ZnO films, with options for even higher purity for advanced research.
• Expertise in Reactive Sputtering Materials: We provide technical guidance on target specifications optimized for stable, reproducible reactive sputtering processes to produce high-quality ZnO.
• Custom Solutions: We tailor target dimensions, bonding, and packaging to your specific system and process flow, from lab-scale R&D to production coating.

Next Steps: Get a Custom Quote

To receive a formal quotation or technical consultation, please provide:

1. Required purity (e.g., 99.99%, 99.999%).
2. Target dimensions (Thickness x Width x Length or Diameter x Thickness) and shape.
3. Primary application (e.g., AZO for TCO, ZnO piezoelectric films, pure Zn corrosion coating).
4. If for reactive sputtering, any specific film property goals (e.g., resistivity, transparency).