Chemical Formula: B
Catalog Number: ST0005
CAS Number: 7440-42-8
Purity: >99.5%, 99.9% available
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Stanford Advanced Materials (SAM) supplies high-purity boron sputtering targets designed for precision thin-film deposition in PVD and CVD systems. Manufactured using high-density, fine-grain boron, these targets offer excellent sputtering performance, chemical stability, and uniform coating quality. Custom sizes and bonding services are available to meet specific requirements.
Boron for Advanced Thin Film Applications
| Material Type | Boron (B) |
| Color/Appearance | Black, semi-metallic |
| Purity | 99.5% – 99.9% |
| Density | 2.34 g/cm³ (crystalline) |
| Melting Point | 271.3 °C |
| Boiling Point | 2550 °C |
| Thermal Conductivity | 27 W/m·K |
| Available Sizes | Ø1″ to Ø6″, thickness 0.125″–0.25″ |
| Bonding Options | Copper, Indium, Elastomer |
| Notes | Forms carbide with container; may crack under rapid cooling |
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
Boron sputtering targets are widely used in:
Semiconductor & Microelectronics
Thin-film deposition for barrier layers, passivation coatings, and advanced transistors
Photovoltaics & Solar Panels
Functional layers in thin-film solar cells and surface passivation
Optical & Decorative Coatings
Durable coatings on glass, mirrors, and displays
Nuclear Industry
Neutron absorption layers in control rods and shielding applications
LEDs & Flat Panel Displays
Transparent conductive and barrier layers in next-gen electronics
Boron sputter targets can be bonded by Copper or other options. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Each boron sputtering target is individually packaged in vacuum-sealed containers with shock-proof foam lining. All shipments are clearly labeled and handled with care to prevent contamination and physical damage during transit.
| Purity | Diameter | Thickness | Bonding | Availability |
|---|---|---|---|---|
| 99.9% | 2″ | 0.25″ | None | On Request |
| 99.9% | 3″ | 0.25″ | Indium | On Request |
| Custom | 1–6″ | Any | Yes | On Request |
Contact us for custom solutions →
High purity B sputtering targets are good magnetron sputtering materials. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
Submit your review | |
The boron sputter target I got from Stanford Advanced Materials is a very good purchase. The target is strong and can deposit a film of good uniformity. Thanks
