Chemical Formula: B
Catalog Number: ST0005
CAS Number: 7440-42-8
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Boron sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is your one-stop source to find boron targets for sale.
Boron sputtering target has the same properties as boron. Boron is a chemical element that originated from the Arabic ‘buraq’, which was the name for borax. “B” is the canonical chemical symbol of boron. The abundance of Boron ranks third in the earth’s crust.
Pure boron is a dark amorphous powder. It is used as a rocket fuel igniter and in pyrotechnic flares and gives the flares a distinctive green color. The most important role of boron is to improve the hardenability of steel, so it can increase the hardenable size of steel, or improve the uniformity of microstructure and properties in the cross-section of steel after quenching and quenching.
|2.34 cryst. g/cm3
|Type of Bond
|Explodes with rapid cooling. Forms carbide with the container.
|Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
Boron sputtering targets are used for thin film deposition, typically for fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, glass coating, etc. Elemental boron occupies an important position in nuclear reactors because of its neutron absorbing ability. Boron steel is used as the control rod material. Boron compounds can be used in a variety of applications, including the manufacture of certain grades of glass and cleaners.
Boron sputter targets can be bonded by Indium Bonding and Elastomer Bonding. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Boron sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
High purity B sputtering targets are good magnetron sputtering materials. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
Submit your review
The boron sputter target I got from Stanford Advanced Materials is a very good purchase. The target is strong and can deposit a film of good uniformity. Thanks