Chemical Formula: B
Catalog Number: ST0005
CAS Number: 7440-42-8
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Boron is a chemical element originated from the Arabic ‘buraq’, which was the name for borax. It was first mentioned in 1808 and observed by L. Gay-Lussac and L.J. ThÃ©nard. The isolation was later accomplished and announced by H. Davy. “B” is the canonical chemical symbol of boron. Its atomic number in the periodic table of elements is 5 with location at Period 2 and Group 13, belonging to the p-block. The relative atomic mass of boron is 10.811(7) Dalton, the number in the brackets indicating the uncertainty.
|Melting Point||271.3 °C|
|Boiling Point||2550 °C|
|Density||2.34 cryst. g/cm3|
|Type of Bond||Indium, Elastomer|
|Comments||Explodes with rapid cooling. Forms carbide with the container.|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
Indium Bonding and Elastomer Bonding are recommended for Boron Sputtering Target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Our boron sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM’s boron sputtering targets are good magnetron sputtering materials. They are available in various forms, purities, sizes, and prices. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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The boron sputter target I got from Stanford Advanced Materials is a very good purchase. The target is strong and can deposit a film of good uniformity. Thanks