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(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0005 Boron (B) Sputtering Target

Chemical Formula: B
Catalog Number: ST0005
CAS Number: 7440-42-8
Purity: >99.5%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made




Description

Indium Bonding and Elastomer Bonding are recommended for Boron Sputtering Target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.

Target Bonding Services

Specification of Boron Sputtering Target

Material Type Boron
Symbol B
Color/Appearance Black, Semi-metallic
Melting Point 271.3 °C
Boiling Point 2550 °C
Density 2.34 cryst. g/cm3
Sputter DC
Type of Bond Indium, Elastomer
Comments Explodes with rapid cooling. Forms carbide with the container.

Available Sizes of Boron Sputtering Target

Material Size
Bismuth, Bi 2.00″ Dia. x 0.125″ Thick
Bismuth, Bi 2.00″ Dia. x 0.250″ Thick
Bismuth, Bi 3.00″ Dia. x 0.125″ Thick
Bismuth, Bi 4.00″ Dia. x 0.250″ Thick

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Description of  Boron Sputtering Target

BoronBoron is a chemical element originated from the Arabic ‘buraq’, which was the name for borax. It was first mentioned in 1808 and observed by L. Gay-Lussac and L.J. Thénard. The isolation was later accomplished and announced by H. Davy. “B” is the canonical chemical symbol of boron. Its atomic number in the periodic table of elements is 5 with location at Period 2 and Group 13, belonging to the p-block. The relative atomic mass of boron is 10.811(7) Dalton, the number in the brackets indicating the uncertainty.

Packaging

Our boron sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

SAM’s boron sputtering targets are good magnetron sputtering materials. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and applications. Get an inquiry right now.

 

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Boron (B) Sputtering Target
Average rating:  
 1 reviews
by Andrew R. Rabb on Boron (B) Sputtering Target
They worked Great!

The boron sputter target I got from Stanford Advanced Materials is a very good purchase. The target is strong and can deposit a film of good uniformity. Thanks