Our Niobium Rotary Sputtering Targets are engineered for volume production, combining the essential ultra-high purity of niobium with the efficiency and uniformity of a rotary design. This configuration is critical for coating large-area substrates such as particle accelerator cavity interiors or for high-volume semiconductor wafer processing, where cost-effective, uniform deposition is paramount.
| Material | Niobium (Nb) |
| Purity | ≥ 99.95% (3N5) Standard |
| Form | Rotary Sputtering Target (Tubular) |
| Key Benefit | Large-Area Uniformity & High Material Utilization |
Key Advantage: The tubular geometry ensures extremely uniform erosion and niobium flux, enabling consistent film properties across meter-scale substrates—a critical factor for the performance of superconducting radio-frequency (SRF) cavities and production-grade barrier layers.
Customization: Purity (up to 99.99%+ RRR), tube dimensions (OD, ID, Length), and bonding fully customizable.
Typical Applications: Interior coatings for superconducting RF (SRF) accelerator cavities, high-volume deposition of Nb-based diffusion barriers/liners, and large-area corrosion-resistant coatings.
For detailed evaluation and procurement (Standard Reference: ST11198).
| Parameter | Specification / Typical Value |
|---|---|
| Material | Niobium (Nb) |
| Purity (Standard) | ≥ 99.95% |
| Available Purity (RRR) | 99.95%, 99.99% (RRR >300) |
| Density | ≥ 8.57 g/cm³ |
| Superconducting Tc | 9.25 K (High-Purity Film) |
| Melting Point | 2477 °C |
| Thermal Conductivity | 54 W/(m·K) |
| Standard Shape | Tubular (Seamless Cylinder) |
| Key Dimensions | Custom OD, ID, Length |
| Sputtering Method | DC Magnetron, HiPIMS |
| Cooling Requirement | High (essential for high-power sputtering of refractory metal) |
| Bonding/Integration | Engineered for secure mounting and optimal thermal contact on cooled rotary mandrels |
| Certification | Certificate of Analysis (CoA) with impurity data provided |
1. Enabling Next-Generation Particle Accelerators
A transformative application for niobium rotary targets is the internal coating of large, complex-shaped copper cavities used in particle accelerators (SRF cavities). Sputtering a thin, high-purity niobium film onto the copper substrate can match or exceed the performance of bulk niobium cavities at a fraction of the cost and with better thermal stability. The rotary target is ideal for this application because it can be integrated into systems designed to uniformly coat the interior surfaces of these large, cylindrical cavities, ensuring consistent superconducting properties throughout.
2. Scaling Advanced Semiconductor Processes
As niobium and niobium nitride (NbN) gain traction as advanced barrier/liner materials in semiconductor manufacturing, transitioning from R&D to production requires high-throughput tools. Rotary targets are the standard in high-volume 300mm wafer fabs. Their use for niobium enables:
Uniform Barrier Thickness: Critical for consistent device performance and yield across the wafer.
High Deposition Rates & Uptime: Meets the throughput demands of production lines.
Cost-Effective Material Use: Maximizes utilization of high-purity niobium.
3. Precision Engineering for Demanding Applications
A niobium rotary target must withstand high power densities while maintaining material integrity. Our manufacturing ensures:
High Density & Purity: Achieved via electron-beam melting and forging, minimizing impurities that degrade superconducting or film properties.
Precise Geometry: Excellent concentricity, straightness, and wall thickness uniformity are critical for stable rotation, even erosion, and efficient cooling.
Controlled Grain Structure: A fine, uniform grain size promotes smooth sputtering and high-quality films.
Beyond chemical purity (verified by GDMS), we perform ultrasonic testing to check for internal flaws in the tubular structure. Dimensional mapping ensures the target meets precise specifications for integration into high-precision coating systems. For SRF applications, we can provide RRR measurements on witness samples from the same ingot, giving direct insight into the electronic quality of the material.
Expertise in Large-Area Coating Solutions: We understand the engineering challenges of coating complex, large-scale components like SRF cavities.
Supplier to High-Tech Industries: We provide materials for both accelerator science and advanced semiconductor development.
Full Integration Support: We offer guidance on target specifications, bonding, and optimal sputtering parameters for rotary systems handling refractory metals.
Get a Formal Quote or Technical Consultation
Niobium rotary targets are system-critical components. For a precise quote and compatibility review, please provide:
Application (e.g., SRF cavity coating, semiconductor barrier deposition).
Required purity (including any specific RRR or impurity limits).
Rotary target dimensions or your cathode model and substrate details.
