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(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA

Molybdenum (Mo) Sputtering Target

Chemical Formula:Mo
Catalog Number:ST0030
CAS Number:7439-98-7
Purity:>99.9%, 99.95%
Shape:Discs, Plates, Column Targets, Step Targets, Custom-made




Description

Chemical Elements

Molybdenum

MolybdenumMolybdenum is a chemical element originated from the Greek ‘molybdos’ meaning lead. It was first mentioned in 1778 and observed by W. Scheele. The isolation was later accomplished and announced by J. Hjelm. “Mo” is the canonical chemical symbol of molybdenum. Its atomic number in the periodic table of elements is 42 with location at Period 5 and Group 6, belonging to the d-block. The relative atomic mass of molybdenum is 95.94(2) Dalton, the number in the brackets indicating the uncertainty.

Molybdenum sputtering targets made of molybdenum are available in form of rotary and planar targets. Molybdenum targets have a density of almost 100 %. You benefit from a faster process due to higher sputtering speeds. The denser the molybdenum target is, the better the conductivity of the created layer. SAM specializes in producing high purity Molybdenum Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in the PVD, CVD, APS and VPS coating processes.

Packaging

Our materials are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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SAM specializes in producing high purity Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.