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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0030 Molybdenum Sputtering Target, Mo

Chemical Formula: Mo
Catalog Number: ST0030
CAS Number: 7439-98-7
Purity: >99.9%, 99.95%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Molybdenum sputtering target is available in various forms, purities, sizes, and prices. We manufacture molybdenum target according to your specifications.

Molybdenum Sputtering Target Safety Data Sheet

 




Description

Molybdenum Sputtering Target Description

MolybdenumMolybdenum sputtering target shares properties with their source material, either pure molybdenum or molybdenum alloy. You benefit from a faster process due to higher sputtering speeds. Molybdenum target has a density of almost 100 %. The denser the Mo target is, the better the conductivity of the created layer. SAM specializes in producing high purity sputtering target materials with the highest possible density and smallest possible average grain sizes for use in the PVD, CVD, APS and VPS coating processes.

Molybdenum Sputtering Target Specification

Material Type Molybdenum
Symbol Mo
Color/Appearance Grey, Metallic
Melting Point  2,617 °C
Sputter DC
Type of Bond Indium, Elastomer
Comments Films smooth, hard. Careful degas required.
Density 10280 kg/m3
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Molybdenum Sputtering Target Applications

High performance molybdenum sputtering materials are used for thin film coating applications, CD-ROM, decoration, flat panel displays, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Planar and Rotary Molybdenum Sputtering Target

Our planar molybdenum sputtering targets have high purity & density and uniform microstructure that can be perfectly applied in depositing thin films in TFT displays and other related industries. Both of single and multi-piece molybdenum planar targets are available.

Our rotatory molybdenum sputtering targets have a high utilization rate of more than 75% that ensure you make full use of the target materials.

Planar & Rotary Molybdenum Sputtering Target

Target Bonding of Molybdenum Sputtering Target

Indium Bonding and Elastomeric Target Bonding Service are available for molybdenum sputtering target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.

Target Bonding Services

Packaging

Our molybdenum sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Get Contact

SAM’s molybdenum sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.

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Molybdenum (Mo) Sputtering Target
Average rating:  
 1 reviews
by David Wilson on Molybdenum (Mo) Sputtering Target
The size is what I wanted

I got exactly what I wanted to receive. Exact size as advertised. There are too many options of sizes. Will buy it again.