| Chemical Formula | GaPd2 |
| Catalog No. | ST0964 |
| CAS Number | – |
| Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
| Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
Gallium-Palladium Sputtering Targets have unique properties that make them suitable for a wide range of applications. The target is precision prepared to ensure high purity and homogeneity, providing a reliable basis for thin film deposition. If you require further information or have specific inquiries, feel free to contact us.
Gallium-Palladium Sputtering Targets exhibit distinctive properties suitable for a diverse range of applications. These targets undergo precision preparation, ensuring high purity and uniformity, establishing a dependable foundation for thin film deposition. The compound’s inherent characteristics position it as a crucial component in electronic, optical, and magnetic materials. Gallium-Palladium Sputtering Targets not only hold promise in semiconductor technology but also showcase unique value in the exploration and fabrication of magnetic materials. Their adaptability renders them highly sought-after for advanced technology and high-tech applications.
By being employed in thin-film preparation, Gallium-Palladium Sputtering Targets play a pivotal role in realizing high-performance electronic devices, optical films, and magnetic applications. In both scientific research and industry, Gallium-Palladium Sputtering Targets underscore their significance in materials science and technological innovation.
Related Product: Gallium (III) Selenide Sputtering Target, CIGS Copper Indium Gallium-Palladium Sputtering Target
| Compound Formula | GaPd2 |
| Molecular Weight | 282.6 |
| Appearance | Silver Metallic Target |
| Melting Point | – |
| Density | – |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
In the realm of electronic, optical, and magnetic materials, GaPd2 stands out as a crucial component due to its inherent characteristics. Beyond its potential in semiconductor technology, Gallium-Palladium Sputtering Targets reveal distinctive value in the exploration and fabrication of magnetic materials, adding to their versatility for advanced technology and high-tech applications.
Gallium-Palladium Sputtering Targets, with their adaptability, become highly sought-after elements for a variety of applications. By playing a pivotal role in thin-film preparation, Gallium-Palladium Sputtering Targets contribute significantly to the realization of high-performance electronic devices, optical films, and magnetic applications. This multifaceted utility underscores the targets’ significance in both scientific research and industry, emphasizing their integral role in materials science and technological innovation.
Our Gallium-Palladium Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Gallium-Palladium Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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