(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0925 Molybdenum Boride Sputtering Target, Mo2B

Chemical Formula Mo2B
Catalog No. ST0925
CAS Number 12006-99-4
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

The Molybdenum Boride Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) boasts extensive experience in providing Molybdenum Boride Sputtering Targets with both high purity and competitive pricing.




Description

Molybdenum Boride Sputtering Target Description

Molybdenum Boride Sputtering Target is used in a process called sputtering, which is a technique for depositing thin films onto a substrate. In sputtering, high-energy ions bombard a target material, causing atoms or molecules to be ejected from the target surface. These ejected particles then form a thin film on a substrate.

Applications of Molybdenum Boride Sputtering Targets are often used in the production of coatings for various purposes, such as improving the wear resistance of tools, enhancing the durability of surfaces, or providing specific optical or electrical properties.

Related Product: Molybdenum Boride Sputtering Target (Mo2B5)

Molybdenum Boride Sputtering Target Specifications

Compound Formula Mo2B
Molecular Weight 202.69
Appearance Gray target
Melting Point 2000
Density (g/cm3) 9.2
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Molybdenum Boride Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Molybdenum Boride Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Molybdenum Boride Sputtering Target Application

Molybdenum Boride Sputtering Target is widely used in the production of coatings for tools, electronic devices, or other surfaces where these properties are desirable.

Molybdenum Boride Sputtering Target Packaging

Our Molybdenum Boride Sputtering Target is widely used in the production of coatings for various purposes, such as improving the wear resistance of tools, enhancing the durability of surfaces, or providing specific optical or electrical properties.

Get Contact

SAM’s Molybdenum Boride Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.

Molybdenum Boride Sputtering Target, Mo2B
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