Chemical Formula: MoO3
Catalog Number: ST0177
CAS Number: 1313-27-5
Purity: >99.9%, 99.95%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Stanford Advanced Materials (SAM) supplies a variety of molybdenum oxide sputtering targets, available as discs, plates, column targets, step targets, etc. We have extensive machining capabilities to provide molybdenum oxide sputtering target in standard sizes or custom products finished to your exact specifications.
Molybdenum oxide sputtering target from Stanford Advanced Materials is an oxide sputtering material containing Mg and O.
Molybdenum is a chemical element that originated from the Greek ‘molybdos’ meaning lead. It was first mentioned in 1778 and observed by W. Scheele. The isolation was later accomplished and announced by J. Hjelm. “Mo” is the canonical chemical symbol of molybdenum. Its atomic number in the periodic table of elements is 42 with a location at Period 5 and Group 6, belonging to the d-block. The relative atomic mass of molybdenum is 95.94(2) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Molybdenum Sputtering Target
Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Oxide Ceramic Sputtering Target
|Material Type||Molybdenum Oxide|
|Melting Point||795° C|
|Type of Bond||Indium, Elastomer|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
1. Indium Bonding and Elastomeric Bonding are recommended for molybdenum oxide sputtering target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services.
2. This material has a low thermal conductivity are susceptible to thermal shock.
Our molybdenum oxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM’s molybdenum oxide sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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Five stars. Awesome product fast shipping!