|Purity||99.9%, 99.95%, 99.99%, 99.995%, 99.999%|
|Shape||Discs, Plates, Column Targets, Step Targets, Custom-made|
The Cadmium Stannate Sputtering Target is available in various forms, purities, and sizes. Stanford Advanced Materials (SAM) offers high-quality Cadmium Stannate Sputtering Targets at the most competitive prices.
Cadmium Stannate Sputtering Target is a specialized material used in the sputter deposition process to create thin films for various applications in electronics, optics, and other industries. The sputtering process involves bombarding a target material with high-energy ions, causing atoms or molecules to be ejected from the target surface. These ejected particles then deposit onto a substrate, forming a thin film.
Cadmium Stannate (Cd2SnO4) is a compound composed of cadmium (Cd), tin (Sn), and oxygen (O). It is known for its unique electrical and optical properties, making it suitable for applications in transparent conducting films.
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Cadmium Stannate Sputtering Target is suitable for applications in transparent conducting films. The resulting thin film from a Cadmium Stannate Sputtering Target is transparent and electrically conductive, making it useful in applications such as transparent electrodes for displays, solar cells, and other electronic devices.
Our Cadmium Stannate Sputtering Targets are carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Cadmium Stannate Sputtering Targets are available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.