(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0401 Rotatory Molybdenum (Mo) Sputtering Target

Chemical Formula: Mo
Catalog Number: ST0401
CAS Number: 7439-98-7
Purity: 99.95% -99.97%
Thermal Conductivity: 139 W/m.K
Melting Point (°C): 2,617
Coefficient of Thermal Expansion: 4.8 x 10-6/K

Rotatory molybdenum sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is your one-stop source to find rotary sputter targets for sale.


Rotatory Molybdenum Sputtering Target Description

MolybdenumRotatory molybdenum sputtering target is a series of processed products of high-purity molybdenum material, and it has a specific size and shape of high-purity molybdenum material. It is used for vacuum coating. Molybdenum metal is silvery-white and very hard. Its melting point is 2623°C (4753°F), which is only lower than tantalum, osmium, rhenium, tungsten among natural elements. It also has one of the lowest coefficients of thermal expansion among metals in commercial use.

Related Post: Molybdenum Sputtering Target

Rotatory Molybdenum Sputtering Target Specification

Dimension 5.5”-7” 5”-5.5” <138”
Material Type Molybdenum
Symbol Mo
Color/Appearance Grey, Metallic
Melting Point  2,617 °C
Sputter DC
Type of Bond Indium, Elastomer
Comments Films smooth, hard. Careful degas required.
Density 10280 kg/m3

Rotatory Target VS. Planar Target

Comparing with planar targets, rotatory target contains more material and offers a greater utilization, which means longer production runs and reduced downtime of the system, increases the throughput of the coating equipment. Besides, rotary sputter target allows the use of higher power densities due to the heat build-up being spread evenly over the surface area of the target. As a consequence, an increased deposition speed can be seen along with an improved performance during reactive sputtering.


Our rotatory molybdenum sputtering target are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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SAM specializes in producing high purity rotatory molybdenum sputtering target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

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Rotatory Molybdenum (Mo) Sputtering Target
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 1 reviews
by Monita Spradlin on Rotatory Molybdenum (Mo) Sputtering Target

Delivered as expected. great for the sputter coating. better than planar target. no complaints!