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(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA

Rotatory Molybdenum (Mo) Sputtering Target

Chemical Formula: Mo
Catalog Number: ST0401
CAS Number: 7439-98-7
Purity: 99.95% -99.97%
Thermal Conductivity: 139 W/m.K
Melting Point (°C): 2,617
Coefficient of Thermal Expansion: 4.8 x 10-6/K




Description

Comparing with planar targets, rotatory target contains more material and offers a greater utilization, which means longer production runs and reduced downtime of the system, increases the throughput of the coating equipment. Besides, rotary sputter target allows the use of higher power densities due to the heat build-up being spread evenly over the surface area of the target. As a consequence, an increased deposition speed can be seen along with an improved performance during reactive sputtering.

OD ID L
Dimension 5.5”-7” 5”-5.5” <138”