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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0192 Terbium Oxide Sputtering Target, Tb4O7

Chemical Formula: Tb4O7
Catalog Number: ST0192
CAS Number: 12036-41-8
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

The terbium oxide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality terbium oxide sputter targets at the most competitive prices.

Terbium Oxide MSDS File




Description

Terbium Oxide Sputtering Target Description

Terbium oxide sputtering target from Stanford Advanced Materials is an oxide sputtering material containing Tb and O.

TerbiumTerbium is a chemical element originated from Ytterby, Sweden. It was first mentioned in 1842 and observed by G. Mosander. The isolation was later accomplished and announced by G. Mosander. “Tb” is the canonical chemical symbol of terbium. Its atomic number in the periodic table of elements is 65 with location at Period 6 and Group 3, belonging to the f-block. The relative atomic mass of terbium is 158.92535(2) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Terbium Sputtering Target

OxygenOxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Oxide Ceramic Sputtering Target

Terbium Oxide Sputtering Target Specification

Material Type Terbium Oxide
Symbol Tb4O7
Color/Appearance Brown
Melting Point (°C) Decomposes to Tb2O3
Density  7900 kg/m-3
Molecular Weight 747.69
Exact Mass 174.92 g/mol

Terbium Oxide Sputtering Target Packaging

Our Tb4O7 Terbium Oxide Sputtering Target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

SAM specializes in producing high purity Terbium Oxide Sputtering Target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.

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Terbium Oxide Sputtering Target, Tb4O7
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