(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0457 Manganese Cobalt Oxide Sputtering Target, MnCo2O4

Chemical Formula: MnCo2O4
Catalog Number: ST0457
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Manganese Cobalt Oxide Sputtering Targets are available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide to us.




Description

Manganese Cobalt Oxide Sputtering Target Description

Manganese Cobalt Oxide Sputtering Target is composed of manganese, cobalt, and oxygen. High-purity manganese cobalt oxide sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.

Related products: Manganese Sputtering TargetCobalt Sputtering Target, Oxide Ceramic Sputtering Target

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Manganese Cobalt Oxide Sputtering Target Specification

Material Type Manganese Cobalt Oxide
Symbol MnCo2O4
Color/Appearance Solid
Melting Point N/A
Density N/A
Type of Bond Elastomer, Indium
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Other sizes are also available. Please contact us for customized sputtering targets.

Manganese Cobalt Oxide Sputtering Target Application

The Manganese Cobalt Oxide Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Manganese Cobalt Oxide Sputtering Target Bonding Services

Target Bonding Service is available for Manganese Cobalt Oxide Sputtering Targets. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services.

Manganese Cobalt Oxide Sputtering Target Packaging

Our Manganese Cobalt Oxide Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Get Contact

We specialize in producing high-purity Manganese Cobalt Oxide Sputtering Target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.

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Manganese Cobalt Oxide Sputtering Target, MnCo2O4
Average rating:  
 1 reviews
by David Peterson on Manganese Cobalt Oxide Sputtering Target, MnCo2O4

Individually boxed and shipped nicely. Will buy them from SAM again.