(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0456 Magnesium Zinc Oxide Sputtering Target

Chemical Formula: Mg(1-x)ZnxO
Catalog Number: ST0456
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Magnesium zinc oxide sputtering targets are available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide to us.


Magnesium Zinc Oxide Sputtering Target Description

The magnesium zinc oxide sputtering target is composed of magnesium, zinc, and oxygen. High-purity magnesium-zinc oxide sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.

Related products: Magnesium Sputtering TargetZinc Sputtering Target, Oxide Ceramic Sputtering Target



Magnesium Zinc Oxide Sputtering Target Specification

Material Type Magnesium Zinc Oxide
Symbol Mg(1-x)ZnxO
Color/Appearance White Solid
Melting Point N/A
Density N/A
Type of Bond Elastomer, Indium
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Other sizes are also available. Please contact us for customized sputtering targets.

Magnesium Zinc Oxide Sputtering Target Application

The magnesium zinc oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Magnesium Zinc Oxide Sputtering Target Packaging

Our magnesium zinc oxide sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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We specialize in producing high-purity magnesium zinc oxide sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.

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Magnesium Zinc Oxide Sputtering Target
Average rating:  
 1 reviews
by Craig Workman on Magnesium Zinc Oxide Sputtering Target

I ordered these for some science experiments. They are a great range of sizes and arrived unbroken! Each one is packed in its own box and then all are in a larger box.