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(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0456 Magnesium Zinc Oxide Sputtering Target

Chemical Formula: Mg(1-x)ZnxO
Catalog Number: ST0456
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made




Description

Target Bonding of Magnesium Zinc Oxide Sputtering Target

Target Bonding Service is available for Lead Calcium Titanate Sputtering Targets. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services.

Description of Magnesium Zinc Oxide Sputtering Target

Magnesium

MagnesiumMagnesium is a chemical element originated from Magnesia, a district of Eastern Thessaly in Greece. It was first mentioned in 1755 and observed by J. Black. The isolation was later accomplished and announced by H. Davy. “Mg” is the canonical chemical symbol of magnesium. Its atomic number in the periodic table of elements is 12 with location at Period 3 and Group 2, belonging to the s-block. The relative atomic mass of magnesium is 24.3050(6) Dalton, the number in the brackets indicating the uncertainty.

Zinc

ZincZinc is a chemical element originated from the German, ‘zinc’, which may in turn be derived from the Persian word ‘sing’, meaning stone. It was early used before 1000 BC and discovered by Indian metallurgists. “Zn” is the canonical chemical symbol of zinc. Its atomic number in the periodic table of elements is 30 with location at Period 4 and Group 12, belonging to the d-block. The relative atomic mass of zinc is 65.409(4) Dalton, the number in the brackets indicating the uncertainty.

Packaging of Magnesium Zinc Oxide Sputtering Target

Our Magnesium Zinc Oxide Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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We specialize in producing high purity Magnesium Zinc Oxide Sputtering Target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

 

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Magnesium Zinc Oxide Sputtering Target
Average rating:  
 1 reviews
by Craig Workman on Magnesium Zinc Oxide Sputtering Target

I ordered these for some science experiments. They are a great range of sizes and arrived unbroken! Each one is packed in its own box and then all are in a larger box.