Chemical Formula: BaO
Catalog Number: ST0414
CAS Number: 1304-28-5
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
The barium oxide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality barium oxide sputter targets at the most competitive prices.
Barium oxide sputtering target is a type of oxide ceramic sputtering target composed of Barium and oxide.
Barium is a chemical element originated from the Greek ‘barys’, meaning heavy. It was first mentioned in 1772 and observed by W. Scheele. The isolation was later accomplished and announced by H. Davy. “Ba” is the canonical chemical symbol of barium. Its atomic number in the periodic table of elements is 56 with location at Period 6 and Group 2, belonging to the s-block. The relative atomic mass of barium is 137.327(7) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Barium Sputtering Target
• Manufacturing – Cold pressed – Sintered, Elastomer bonded to the backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, Protection from environmental contaminants, Protection during shipment.
|Material Type||Barium Oxide|
|Color/Appearance||White, Crystalline Solid|
|Sputter||RF, RF-R, DC|
|Type of Bond||Indium, Elastomer|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Indium Bonding and Elastomeric Target Bonding Service are available for the barium oxide sputtering target. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Our barium oxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM’s barium oxide sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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