(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0220 Zirconium Nitride Sputtering Target, ZrN

Chemical Formula: ZrN
Catalog Number: ST0220
CAS Number: 25658-42-8
Purity: 99.5%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

The zirconium nitride sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality zirconium nitride sputter targets at the most competitive prices.




Description

Zirconium Nitride Sputtering Target Description

Zirconium Nitride sputtering target from Stanford Advanced Materials is a nitride ceramic sputtering material with the formula ZrN.

ZirconiumZirconium is a chemical element that originated from the Persian ‘zargun’, meaning gold coloured. It was first mentioned in 1789 and observed by H. Klaproth. The isolation was later accomplished and announced by J. Berzelius. “Zr” is the canonical chemical symbol of zirconium. Its atomic number in the periodic table of elements is 40 with a location at Period 5 and Group 4, belonging to the d-block. The relative atomic mass of zirconium is 91.224(2) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Zirconium Sputtering Target

NitrogenNitrogen is a chemical element that originated from the Greek ‘nitron’ and ‘genes’ meaning nitre-forming. It was first mentioned in 1772 and observed by D. Rutherford. The isolation was later accomplished and announced by D. Rutherford. “N” is the canonical chemical symbol of nitrogen. Its atomic number in the periodic table of elements is 7 with a location at Period 2 and Group 15, belonging to the p-block. The relative atomic mass of nitrogen is 14.0067(2) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Nitride Ceramic Sputtering Target

Zirconium Nitride Sputtering Target Specification

Material Type Zirconium Nitride
Symbol ZrN
Color/Appearance Yellow-brown
Melting Point 2980 °C
Density 7.09 g/cm3
Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Zirconium Nitride Sputtering Target Application

The zirconium nitride sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Zirconium Nitride Sputtering Target Packaging

Our zirconium nitride sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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High-quality zirconium nitride sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.