(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0960 Europium Nitride Sputtering Target, EuN

Chemical Formula EuN
Catalog No. ST0960
CAS Number 12020-58-5
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

Europium Nitride Sputtering Target provided by Stanford Advanced Materials (SAM) is a premium material for thin film deposition. Explore cutting-edge thin film technology with EuN, symbolizing professional excellence in the field of sputtering targets. If you require further information or have specific inquiries, feel free to contact us.


Europium Nitride Sputtering Target Description

Europium Nitride Sputtering Targets provided by Stanford Advanced Materials (SAM) are precision prepared with excellent high purity, which helps to achieve pure and uniform deposition of thin films. The magnetic properties imparted by the element europium make it excellent in the preparation of magnetic materials for applications such as magnetic storage and magnetic sensors. EuN is chemically stable, providing reliability for thin film deposition, and is suitable for long-term experiments and applications. High conductivity ensures uniform deposition during sputtering, improving film uniformity and performance. Europium Nitride Sputtering Targets are widely used in optical films, magnetic films, and electronic components, providing critical material support for high-tech applications.

Related Product: Europium Sputtering Target, Europium Oxide Sputtering Target

Europium Nitride Sputtering Target Specifications

Compound Formula EuN
Molecular Weight 165.97
Appearance Black Target
Melting Point
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Europium Nitride Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Europium Nitride Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Europium Nitride Sputtering Target Application

  1. Optical Thin Film Technology: Used in the preparation of optical thin films such as reflector sheets and optical coatings to provide high-performance coatings for lasers and other optical devices.
  2. Magnetic thin film applications: Due to their magnetic properties, Europium Nitride Sputtering Targets play a key role in magnetic storage, magnetic sensors, and magnetic component preparation.
  3. Electronic Component Manufacturing: Used in the preparation of thin films for electronic components such as magnetoresistors, magneto-electric sensors, etc. to improve the performance of electronic components.
  4. Magneto-optical storage technology: Applied in the field of magneto-optical storage, supporting the preparation of high-density and high-performance magnetic storage media.
  5. Magnetic navigation systems: In the manufacture of magnetic sensors for magnetic navigation systems, Europium Nitride Sputtering Targets ensure the sensitivity and accuracy of the sensors.

Europium Nitride Sputtering Target Packaging

Our Europium Nitride Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

Get Contact

SAM’s Europium Nitride Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.

Submit your review

Create your own review

Europium Nitride Sputtering Target, EuN
Average rating:  
 0 reviews