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High-Entropy Alloy (HEA) Sputtering Target

Processing Methods for Preparing High Entropy Alloy Sputtering Targets

Introduction High entropy alloy sputtering targets are becoming popular due to their impressive properties and wide-ranging uses in modern industry. There are two main approaches to creating these targets. One involves a special smelting process, while the other makes use of powder metallurgy. Over many years, these methods have been refined to meet the demands...
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Anti-Reflective Coatings

Applications of Zinc Oxide Sputtering Targets in Glass Coatings

Zinc Oxide (ZnO) sputtering targets are a key material utilized during the deposition process known as magnetron sputtering. In the process, high-energy ions strike the target and eject zinc oxide atoms. The ejected atoms deposit themselves on substrates such as glass, forming a thin yet strong film. These Zinc Oxide films have been greatly helpful...
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sputtering-targets

Everything You Need to Know About Sputtering Targets

1. Introduction to Sputtering Targets Sputtering targets are significant commodities for thin-film industries like electronics, optics, and energy sectors. Simply put, a “sputtering target” is the target material utilized for sputtering, a form of physical vapor deposition (PVD). During the PVD process, atoms from a solid target are removed and ejected upon impact by high-energy...
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Silicon Wafer

Comparing Magnesium and Magnesium Oxide Targets for Thin Film Deposition on Silicon

Magnesium vs. Magnesium Oxide Targets – Which One Gets Better Film on Silicon? High-quality thin films play a big role in electronic and optical devices. Over the years, the choice of sputtering target has been shown to significantly influence film properties. When depositing magnesium oxide films on silicon, the selected target—either pure magnesium or magnesium...
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Titanium Sputtering Targets: Shapes and Applications

Titanium Sputtering Targets: Shapes and Applications

Titanium is a widely used material in thin film technology due to its high strength, corrosion resistance, and compatibility with a broad range of substrates. In sputtering, titanium targets are applied to deposit thin metallic films directly, or to form compound films such as titanium nitride (TiN) and titanium dioxide (TiO₂). These coatings are valued...
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Copper Target Shape

Copper Sputter Targets: Shapes and Applications

Copper sputter targets are used to deposit thin metal films on various substrates. They are chosen for their electrical and thermal conductivity, ductility, and adhesion properties. Thin films from copper appear in electronics, solar cells, displays, and decorative coatings. The shape and size of the target influence deposition uniformity and material usage. Target Shapes Planar...
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Niobium metal

High-Purity Niobium Sputtering Targets in Semiconductor Chip Fabrication

Introduction Thin film deposition is an integral part of semiconductor chip production. Sputtering is perhaps the most established and reliable method of placing smooth films on wafers. Among all the materials that have been employed as targets, niobium stands out for its unique combination of electrical, thermal, and chemical properties that qualify it perfectly for...
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Platinum vs. Gold Ring

Should You Choose Platinum or Gold for Your Wedding Ring in 2025?

Back in 2019, we published a guide comparing platinum and gold rings. It quickly became one of our most-read articles, helping readers make informed choices about their wedding jewelry. But times have changed — and so have the reasons behind choosing one metal over the other. If you’re shopping in 2025, here’s what actually matters....
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Semiconductor_Chip

Zirconium Sputtering Targets in Semiconductor Chip Manufacturing

Introduction The semiconductor industry is driving the technological revolution, fueling the progress of electronics, computing, and communications. As performance demands rise and chip dimensions continue to be reduced, the material employed for their manufacture must conform to increasingly stringent specifications. High-purity zirconium sputtering targets have become a flagship material for the industry, making it possible to form high-quality metal oxide thin films, gate material, as well as metal interconnect layers. This article...
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