Chemical Formula: LiFePO4
Catalog Number: ST0529
CAS Number: 15365-14-7
Purity: 99.5%, 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Lithium iron phosphate sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality lithium iron phosphate sputter target at the most competitive price.
Lithium iron phosphate sputtering target is a mixed oxide ceramic sputtering target, usually made by high-temperature sintering/recrystallization of oxide mixture of Li and Fe. Lithium iron phosphate is a gray, red-grey, brown or black solid that is insoluble in water. It has very special physical properties and has special applications in the electronics, superconductivity, and optical industries.
|Material Type||Lithium Iron Phosphate Sputtering Target|
|Melting Point||>300 °C|
|Sputter||RF, RF-R, DC|
|Type of Bond||Indium, Elastomer|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Lithium Iron Phosphate (LiFePO4) sputtering targets find applications in various fields, especially in the development of lithium-ion batteries and energy storage systems. These targets are crucial for depositing thin films of LiFePO4 on substrates. LiFePO4 is known for its stability, high energy density, and safety, making it a popular choice for rechargeable batteries.
Indium bonding and Elastomer bonding are available for the LiFePO4 sputtering materials. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company to provide bonding services. For questions about target bonding materials, methods, and services, please click here.
Our lithium iron phosphate sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
High-Quality lithium iron phosphate sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high-purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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So far so good. The price is reasonable and the shipping is fast.