Chemical Formula: LiFePO4
Catalog Number: ST0529
CAS Number: 15365-14-7
Purity: 99.5%, 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Lithium iron phosphate sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high quality lithium iron phosphate sputter target at the most competitive price.
Lithium iron phosphate sputtering target is a mixed oxide ceramic sputtering targets, usually made by high-temperature sintering/recrystallization of oxide mixture of Li and Fe. Lithium iron phosphate is a gray, red-grey, brown or black solid that is insoluble in water. It has very special physical properties and has special applications in the electronics, superconductivity and optical industries.
|Material Type||Lithium Iron Phosphate Sputtering Target|
|Melting Point||>300 °C|
|Sputter||RF, RF-R, DC|
|Type of Bond||Indium, Elastomer|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Lithium iron phosphate sputtering targets are used for CD-ROM, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Indium bonding and Elastomer bonding are available for the LiFePO4 sputtering materials. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Our lithium iron phosphate sputter targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
High Quality lithium iron phosphate sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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So far so good. The price is reasonable and the shipping is fast.