Titanium (Ti) Evaporation Materials Archives

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(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA

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Home / Evaporation Materials / By Chemical Elements / Ti

titanium evaporation materials

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VD0586 Titanium (Ti) Evaporation Materials

Tantalum Molybdenum Evaporation Materials

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VD0601 Aluminum Titanium (Al/Ti) Evaporation Materials

Iron Oxide Evaporation Materials

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VD0609 Chromium Titanium (Cr/Ti) Evaporation Materials

Iron Oxide Evaporation Materials

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VD0616 Cobalt Titanium (Co/Ti) Evaporation Materials

Iron Oxide Evaporation Materials

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VD0634 Molybdenum Titanium (Mo/Ti) Evaporation Materials

Nickel Titanium Evaporation Materials

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VD0641 Nickel Titanium (Ni/Ti) Evaporation Materials

Iron Oxide Evaporation Materials

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VD0649 Titanium Aluminum (Ti/Al) Evaporation Materials

Titanium Tungsten Evaporation Materials

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VD0650 Titanium Aluminum Vanadium (Ti/Al/V) Evaporation Materials

alloy evaporation pellets

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VD0651 Titanium Chromium (Ti/Cr) Evaporation Materials

Titanium Tungsten Evaporation Materials

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VD0652 Titanium Cobalt (Ti/Co) Evaporation Materials

titanium nickel evaporation materials

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VD0653 Titanium Nickel (Ti/Ni) Evaporation Materials

Titanium Tungsten Evaporation Materials

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VD0654 Titanium Tungsten (Ti/W) Evaporation Materials

Iron Oxide Evaporation Materials

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VD0654 Tungsten Titanium (W/Ti) Evaporation Materials

vanadium titanium evaporation materials

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VD0658 Vanadium Titanium (V/Ti) Evaporation Materials

Iron Oxide Evaporation Materials

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VD066 Zirconium Titanium (Zr/Ti) Evaporation Materials

Hafnium Oxide Evaporation Materials

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VD0671 Barium Titanate (BaTiO3) Evaporation Materials

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Product categories

Sputtering Target
Bonding Service
Evaporation Materials
Evaporation Sources
- E-Beam Source Used Crucibles
- Thermal sources
Planar Sputtering Target
Precious Metal
Reclaim Service
Rotatory Sputtering Targets

Featured Products

ST0478 Zinc Oxide with Scandia (ZnO/Sc2O3 98/02 wt%) Sputtering Target
ST0477 Zinc Oxide with Manganese (ZnO 0.3 wt% Mn ) Sputtering Target
ST0476 Yttrium Manganate (YMnO3) Sputtering Target
ST0475 Yttrium Ferrite (Y3Fe5O12) Sputtering Target
ST0474 Titanium Silicate (Ti0.44Si0.10O) Sputtering Target

SPUTTERTARGETS

Stanford Advanced Materials (SAM) Corporation is a global supplier of various sputtering targets such as metals, alloys, oxides, ceramic materials. It was first established in 1994 to begin supplying high-quality rare-earth products to assist our customers in the research and development (R&D) fields.

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Recent Posts

Table Comparison: Physical Vapor Deposition Vs. Chemical Vapor Deposition
An Overview of Tantalum Element
Types and Applications of Sputtering Targets in the Electronic Industry
How is the Semiconductor Wafer Manufactured? (With Infographic)
What Are the Applications of Sputtering Targets? (With Video)

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