(949) 407-8904 Mon - Fri 08:00 - 17:00 1940 East Deere Avenue, Suite 100, Santa Ana, CA 92705, USA

Company Dynamic

Solving Superalloy Machining: The Evolution of AlCrN/TiAlN Nanolayer Coating Targets

Solving Superalloy Machining: The Evolution of AlCrN/TiAlN Nanolayer Coating Targets

When machining high-temperature alloys like Inconel or Ti-6Al-4V, the challenge transcends conventional cutting. The process essentially becomes a high-stakes battle—not just against the material’s hardness, but against the extreme heat, work hardening, and abrasive wear it generates at the cutting edge. Under such severe conditions, standard tool coatings degrade rapidly, often reaching their functional limits...
Continue Reading
NbN Thin Film Manufacturing Methods

Fabrication of Niobium Nitride Thin Films: A Critical Analysis of Deposition Methodologies

Niobium nitride (NbN) is widely used in superconducting devices, and its performance depends largely on how its thin film is formed. In this article, we look at four main methods: reactive magnetron sputtering, atomic layer deposition (ALD), pulsed laser deposition (PLD), and chemical vapor deposition (CVD). We explain how process details like gas mix, temperature,...
Continue Reading
ITO vs. AZO

The Clock is Ticking on ITO. Is AZO Finally the Answer?

Here’s a fact that keeps display execs up at night: Your entire transparent electrode supply chain hinges on a metal you don’t actually buy. Indium is a byproduct of zinc mining—its supply is tied to construction demand, not your panel forecasts. When a factory manager told me his “indium price risk” budget now exceeds his maintenance...
Continue Reading

Cost Reduction Path for Large-Size OLED Electrodes: ITO Optimization, Silver Alloys & New TCOs

Abstract: As OLED displays scale to larger formats, the cost of the transparent electrode becomes a critical bottleneck. This article maps the practical engineering strategies for cost reduction across three material fronts: pushing incumbent ITO to its efficiency limits, integrating novel silver alloy anodes, and evaluating the readiness of next-generation TCO alternatives. We provide a decision...
Continue Reading

An Overview of Magnetron Sputtering

An Overview of Magnetron Sputtering Magnetron sputtering, a physical vapor deposition (PVD) process, is a main thin film deposition method for manufacturing semiconductors, disk drives, CDs, and optical devices. Magnetron sputtering has the advantages of high speed, low temperature, and low damage. In this article, let’s take a look at the definition, working principle, and...
Continue Reading
optimize-target-tco

Semiconductor Target TCO Analysis: Boosting Utilization by 30% via Design & Bonding

Abstract: In semiconductor manufacturing, the cost of a PVD sputtering target extends far beyond its purchase price. For 300mm targets, low utilization rates and unscheduled downtime due to bonding failures represent massive, hidden costs. This article provides a Total Cost of Ownership framework, demonstrating how strategic target design (rotary vs. planar, asymmetric erosion profiles) and advanced...
Continue Reading
1 2 3 48