Chemical Formula: VC
Catalog Number: ST0231
CAS Number: 12070-10-9
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
The vanadium carbide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality vanadium carbide sputter targets at the most competitive prices.
Vanadium Carbide sputtering target from Stanford Advanced Materials is a carbide ceramic sputtering material with the formula VC.
Vanadium is a chemical element that originated from Vanadis, an old Norse name for the Scandinavian goddess Freyja. It was first mentioned in 1801 and observed by M. del RÃo. The isolation was later accomplished and announced by N.G.SefstrÃ¶m. “V” is the canonical chemical symbol of vanadium. Its atomic number in the periodic table of elements is 23 with a location at Period 4 and Group 5, belonging to the d-block. The relative atomic mass of vanadium is 50.9415(1) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Vanadium Sputtering Target
Carbon is a chemical element that originated from the Latin ‘carbo’, meaning charcoal. It was early used in 3750 BC and discovered by Egyptians and Sumerians. “C” is the canonical chemical symbol of carbon. Its atomic number in the periodic table of elements is 6 with a location at Period 2 and Group 14, belonging to the p-block. The relative atomic mass of carbon is 12.0107(8) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Carbide Ceramic Sputtering Target
1. Indium bonding is recommended for vanadium carbide sputtering materials, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity and is susceptible to thermal shock.
Our Vanadium Carbide Sputtering Target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM specializes in producing high purity Vanadium Carbide Sputtering Target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.