(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0230 Tungsten Carbide Sputtering Target, WC

Chemical Formula: WC
Catalog Number: ST0230
CAS Number: 12070-12-1
Purity: 99.5%, 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

The tungsten carbide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality tungsten carbide sputter targets at the most competitive prices.

Tungsten Carbide MSDS File

Description

Tungsten Carbide Sputtering Target Description

Tungsten Carbide sputtering target from Stanford Advanced Materials is a carbide ceramic sputtering material with the formula WC.

TungstenTungsten, also called wolfram, is a chemical element that originated from the Swedish ‘tung sten’ meaning heavy stone(W is wolfram, the old name of the tungsten mineral wolframite). It was first mentioned in 1781 and observed by T. Bergman. The isolation was later accomplished and announced by J. and F. Elhuyar. “W” is the canonical chemical symbol of tungsten. Its atomic number in the periodic table of elements is 74 with a location at Period 6 and Group 6, belonging to the d-block. The relative atomic mass of tungsten is 183.84(1) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Tungsten (W) Sputtering Target

CarbonCarbon is a chemical element that originated from the Latin ‘carbo’, meaning charcoal. It was early used in 3750 BC and discovered by Egyptians and Sumerians. “C” is the canonical chemical symbol of carbon. Its atomic number in the periodic table of elements is 6 with a location at Period 2 and Group 14, belonging to the p-block. The relative atomic mass of carbon is 12.0107(8) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Carbide Ceramic Sputtering Target

Tungsten Carbide Sputtering Target Packaging

Our Tungsten Carbide Sputtering Target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

SAM specializes in producing high purity Tungsten Carbide Sputtering Target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.

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Tungsten Carbide Sputtering Target, WC
Average rating:  
 1 reviews
by Wes Pierson on Tungsten Carbide Sputtering Target, WC

Overall, I’m really impressed SAM’s tungsten carbide target. It’s helped my experiment get good results and it’s a very HIGH-PURITY sputtering material for the price.