(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0407 Rotatory Tungsten (W) Sputtering Target

Chemical Formula: W
Catalog Number: ST0407
CAS Number: 7440-33-7
Purity: 99.95%
Thermal Conductivity: 174 W/m.K
Melting Point (°C): 3,410
Coefficient of Thermal Expansion: 4.5 x 10-6/K

Rotatory tungsten sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is your one-stop source to find tungsten sputter targets for sale.


Rotatory Tungsten Sputtering Target Description

TungstenRotatory tungsten sputtering target is a series of processed products of high-purity tungsten material, and it has a specific size and shape of high-purity tungsten material. It is used for vacuum coating.

Tungsten, also called wolfram, is a chemical element originated from the Swedish ‘tung sten’ meaning heavy stone(W is wolfram, the old name of the tungsten mineral wolframite). It was first mentioned in 1781 and observed by T. Bergman. The isolation was later accomplished and announced by J. and F. Elhuyar. “W” is the canonical chemical symbol of tungsten. Its atomic number in the periodic table of elements is 74 with location at Period 6 and Group 6, belonging to the d-block. The relative atomic mass of tungsten is 183.84(1) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Tungsten Sputtering Target

Rotatory Tungsten Sputtering Target Specification

Dimension 5.5”-7” 5”-5.5” <138”

Rotatory Tungsten (W) Sputtering Target

Material Type Tungsten
Symbol W
Color/Appearance Grayish White, Lustrous, Metallic
Melting Point 3410°C
Density 19.3 g/cm3

Rotatory Target VS. Planar Target

Comparing with planar targets, rotatory target contains more material and offers a greater utilization, which means longer production runs and reduced downtime of the system, increases the throughput of the coating equipment. Besides, rotary sputter target allows the use of higher power densities due to the heat build-up being spread evenly over the surface area of the target. As a consequence, an increased deposition speed can be seen along with an improved performance during reactive sputtering.


Our rotatory tungsten sputtering target are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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SAM specializes in producing high purity rotatory tungsten sputtering target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

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Rotatory Tungsten (W) Sputtering Target
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 1 reviews
by AndrewWinney on Rotatory Tungsten (W) Sputtering Target

Due to project needs, I have been looking for rotary tungsten rotating targets and I finally find those with high purity and good price. The result is that these products worked very well