Chemical Formula: W
Catalog Number: ST0407
CAS Number: 7440-33-7
Purity: 99.95%
Thermal Conductivity: 174 W/m.K
Melting Point (°C): 3,410
Coefficient of Thermal Expansion: 4.5 x 10-6/K
OD | ID | L | |
Dimension | 5.5”-7” | 5”-5.5” | <138” |
Related Product: Tungsten (W) Sputtering Target
Related Post: Discovery and development of tungsten | History of Tungsten
Comparing with planar targets, rotatory target contains more material and offers a greater utilization, which means longer production runs and reduced downtime of the system, increases the throughput of the coating equipment. Besides, rotatory sputtering target allows the use of higher power densities due to the heat build-up being spread evenly over the surface area of the target. As a consequence, an increased deposition speed can be seen along with an improved performance during reactive sputtering.
Our materials are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
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Due to project needs, I have been looking for rotary tungsten rotating targets and I finally find those with high purity and good price. The result is that these products worked very well