Chemical Formula: HfC
Catalog Number: ST0223
CAS Number: 12069-85-1
Purity: >99.5%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
The hafnium carbide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality hafnium carbide sputter targets at the most competitive prices.
Hafnium Carbide sputtering target from Stanford Advanced Materials is a carbide ceramic sputtering material with the formula HfC.
Hafnium is a lustrous, silvery gray, tetravalent transition metal, hafnium chemically resembles zirconium and is found in many zirconium minerals. Its existence was predicted by Dmitri Mendeleev in 1869, though it was not identified until 1923, by Coster and Hevesy, making it the last stable element to be discovered. Hafnium is named after Hafnia, the Latin name for Copenhagen, where it was discovered.
Related Product: Hafnium Sputtering Target
Carbon is a chemical element that originated from the Latin ‘carbo’, meaning charcoal. It was early used in 3750 BC and discovered by Egyptians and Sumerians. “C” is the canonical chemical symbol of carbon. Its atomic number in the periodic table of elements is 6 with a location at Period 2 and Group 14, belonging to the p-block. The relative atomic mass of carbon is 12.0107(8) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Carbide Ceramic Sputtering Target
| Compound Formula | HfC |
| Molecular Weight | 190.5 |
| Appearance | Black |
| Melting Point | 3,900° C |
| Boiling Point | N/A |
| Density | 12.20 g/cm3 |
The hafnium carbide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our hafnium carbide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
High-quality hafnium carbide sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.
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