(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0221 Boron Carbide Sputtering Target, B4C

Chemical Formula: B4C
Catalog Number: ST0221
CAS Number: 12069-32-8
Purity: 99.5%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

The boron carbide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality boron carbide sputter targets at the most competitive prices.

Boron Carbide MSDS File




Description

Boron Carbide Sputtering Target Description

Boron Carbide sputtering target from Stanford Advanced Materials is a carbide ceramic sputtering material with the formula NbN.

Boron

Boron is a chemical element that originated from the Arabic ‘buraq’, which was the name for borax. It was first mentioned in 1808 and observed by L. Gay-Lussac and L.J. Thénard. The isolation was later accomplished and announced by H. Davy. “B” is the canonical chemical symbol of boron. Its atomic number in the periodic table of elements is 5 with a location at Period 2 and Group 13, belonging to the p-block. The relative atomic mass of boron is 10.811(7) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Boron Sputtering Target

CarbonCarbon is a chemical element that originated from the Latin ‘carbo’, meaning charcoal. It was early used in 3750 BC and discovered by Egyptians and Sumerians. “C” is the canonical chemical symbol of carbon. Its atomic number in the periodic table of elements is 6 with a location at Period 2 and Group 14, belonging to the p-block. The relative atomic mass of carbon is 12.0107(8) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Carbide Ceramic Sputtering Target

Boron Carbide Sputtering Target Handling Notes

1. Indium bonding is recommended for this material, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.

2. Boron Carbide Sputtering Target has a low thermal conductivity and is susceptible to thermal shock.

Boron Carbide Sputtering Target Application

The boron carbide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Boron Carbide Sputtering Target Packaging

Our boron carbide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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High-quality boron carbide sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.