(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0296 Magnesium Boride Sputtering Target, MgB2

Chemical Formula: MgB2
Catalog Number: ST0296
CAS Number: 12007-25-9
Purity: 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

The magnesium boride sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality magnesium diboride sputter targets at the most competitive prices.




Description

Magnesium Boride Sputtering Target Description

Magnesium boride sputtering target is a type of boride ceramic sputtering target composed of magnesium and boron.

Magnesium

Magnesium is a chemical element originated from Magnesia, a district of Eastern Thessaly in Greece. It was first mentioned in 1755 and observed by J. Black. The isolation was later accomplished and announced by H. Davy. “Mg” is the canonical chemical symbol of magnesium. Its atomic number in the periodic table of elements is 12 with location at Period 3 and Group 2, belonging to the s-block. The relative atomic mass of magnesium is 24.3050(6) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Magnesium Sputtering Target

BoronBoron is a chemical element originated from the Arabic ‘buraq’, which was the name for borax. It was first mentioned in 1808 and observed by L. Gay-Lussac and L.J. Thénard. The isolation was later accomplished and announced by H. Davy. “B” is the canonical chemical symbol of boron. Its atomic number in the periodic table of elements is 5 with location at Period 2 and Group 13, belonging to the p-block. The relative atomic mass of boron is 10.811(7) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Boride Ceramic Sputtering Target

Magnesium Boride Sputtering Target Specification

Compound Formula MgB2
Molecular Weight 45.927
Appearance Gray crystalline solid
Melting Point 830 °C (1,530 °F; 1,100 K)
Density 2.57 g/cm3
Exact Mass 46.003653
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Magnesium Boride Sputtering Target Application

The magnesium boride sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Packaging

Our magnesium boride sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

SAM specializes in producing high purity magnesium boride sputtering target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.

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Magnesium Boride Sputtering Target, MgB2
Average rating:  
 1 reviews
by BrucePool on Magnesium Boride Sputtering Target, MgB2

I'm impressed that the MgB2 target I bought from SAM arrives with the speed i had to blink. the quality is exactly what I was wishing for. This company i will do business with them any day of the day, Thank you.