ST0924 Chromium Boride Sputtering Target, Cr5B3

Chromium Boride Sputtering Target Description

Chromium Boride Sputtering Target is used in a process called sputtering, which is a technique for depositing thin films onto a substrate. In sputtering, high-energy ions bombard a target material, causing atoms or molecules to be ejected from the target surface. These ejected particles then form a thin film on a substrate.

Applications of chromium boride sputtering targets are often used in the production of coatings for various purposes, such as improving the wear resistance of tools, enhancing the durability of surfaces, or providing specific optical or electrical properties.

Related Product: Chromium Boride Sputtering Target

Chromium Boride Sputtering Target Specifications

Chromium Boride Sputtering Target Handling Notes

1. Indium bonding is recommended for Chromium Boride Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity and is susceptible to thermal shock.

Chromium Boride Sputtering Target Application

Chromium Boride Sputtering Target is widely used in various applications in Photovoltaic, Thermoelectric, and Optoelectronic Devices.

Chromium Boride Sputtering Target Packaging

Our Chromium Boride Sputtering Target is widely used in the production of coatings for various purposes, such as improving the wear resistance of tools, enhancing the durability of surfaces, or providing specific optical or electrical properties.

Get Contact

SAM’s Chromium Boride Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.