|99.9%, 99.95%, 99.99%, 99.995%, 99.999%
|Discs, Plates, Column Targets, Step Targets, Custom-made
Known for exceptional purity, Stanford Advanced Materials (SAM) offers Zinc Oxide doped with Magnesium Sputtering Targets. Leveraging extensive expertise in materials science, SAM is committed to delivering tailored solutions and competitive pricing, precisely meeting the demands of nanotechnology and thin-film deposition applications.
Zinc Oxide doped with Magnesium Sputtering Targets exhibit good transparency in the visible and UV spectral range, making them suitable for the preparation of optical coatings and transparent conductive films. Due to the semiconducting properties of zinc oxide and magnesium oxide, Zinc Oxide doped with Magnesium Sputtering Targets play a key role in the preparation of electronic devices such as thin-film transistors and light-emitting diodes. The ratio of zinc oxide to magnesium oxide adjusts the bandgap of ZnMgO, giving it flexibility in energy band engineering and optoelectronics. ZnMgO has good electrical conductivity and is suitable for the preparation of conductive coatings and transparent conductive films. ZnMgO exhibits good thermal stability in high-temperature environments, making it suitable for high-temperature coatings and electronics applications.
|Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Our Zinc Oxide doped with Magnesium Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Zinc Oxide doped with Magnesium Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.