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An Overview of Aluminum Sputtering Target

You may be familiar with aluminum but unfamiliar with aluminum sputtering target. But to some extends, they are the same, consisting of atom Al. In a word, the aluminum sputter target can be considered a product after a series of processes from high-purity aluminum. Aluminum target is a type of sputtering materials used mounted on a vacuum coating machine to deposit a thin film in the vacuum coating industry. The property of the sputtering target directly affects the performance of the obtained film. Here is a short introduction of SAM aluminum sputter target, including how it is made, and its properties, classifications and applications.

Aluminum Sputtering Target Manufacturing Processes

Production and Purification of Aluminum Metal

By extracting aluminum oxide (Al2O3) from bauxite, and then electrolyzing Al2O3 in molten cryolite, a rough aluminum of 99% purity can be obtained. 99% sounds not bad, but if you want to coat a high quality thin film, it is still not the best raw material for producing aluminum sputtering target. The first and the most important requirement of the sputter target is high purity. The high-purity aluminum can be produced by the segregation method, three-layer electrolysis method or combined regional melting method. Since the purification process is complex, high-purity aluminum price is higher than industrial aluminum. SAM provides aluminum targets of high quality and at a competitive price.

Aluminium target
Aluminum sputtering target

Deformation Treatment of Aluminum Sputtering Target

High-purity aluminum ingot is used as the raw materials of the aluminum sputter coater target. There are several steps, include forging, rolling, and heating, so that the crystal grains in the aluminum ingot are fined and the density is increased to meet the requirements of the Al sputter target required for sputtering. Then, the deformed high-purity aluminum material is processed into a target size required for the vacuum coater. The requirements for aluminum target processing are high precision and high surface quality.

Aluminum Sputter Target Specifications

Aluminum Sputtering Target Physical Properties

Chemical Formula  Al
CAS Number  7429-90-5
Material Type Aluminum
Atomic Weight  26.9815386
Atomic Number  13
Color/Appearance  Silvery, Metallic
Thermal Conductivity  235 W/m.K
Melting Point (°C)  660
Coefficient of Thermal Expansion  23.1 x 10-6/K
Theoretical Density (g/cc)  2.7
Sputter  DC

Aluminum Sputtering Target Classification

Aluminum sputtering materials can be divided into planar target and rotatory target. Planar aluminum targets are sheet-shaped, with round, square, and other shapes. Rotatory aluminum target is tubular and has high utilization efficiency. But the process of making rotatory target is much more difficult. A rotatory aluminum target can be obtained through the high-purity aluminum extrusion, stretching, straightening heat treatment, machining and other processing steps.

Planar & Rotary Aluminum Sputtering Target
Planar & Rotary Aluminum Sputter Target

Aluminum Sputtering Target Application

Aluminum sputter target can be used in DC dipole sputtering, three-pole sputtering, four-stage sputtering, RF sputtering, counter target sputtering, ion beam sputtering, magnetron sputtering to produce reflective film, conductive film, semiconductor film, capacitor film, decorative film, protective film, integrated circuit, display, and etc. Compared with other sputtering targets, the price of aluminum targets is lower, so it is a preferred choice under the premise of satisfying the function of the film layer.

Aluminum Sputtering Target Market

Current Situation

Target Name Aluminum sputtering target
Common Purity 99.9%(3N) 99.99%(4N) 99.999%(5N) 99.9999%(6N)
Common Size 100*40mm
Maximum Size Width 3000mm

Prospect

With the rapid development of the electronics industry, the demand for aluminum sputtering targets is also increasing. There is still room for improvement in the purity of aluminum targets; in addition, market standardization of aluminum sputter targets needs to be strengthened.

Thanks for reading this passage and hope that you now have a basic understanding about aluminum sputtering targetStanford Advanced Materials (SAM) is a leading sputtering target manufacturer based in Lake Forest, California. If you feel interested about the aluminum targets, you can go to our product page for more information, or directly send us an inquiry. You can also contact us via target@samaterials.com. Free samples are available.

About the author

Julissa Green graduated from the University of Texas studying applied chemistry. She started her journalism life as a chemistry specialist in Stanford Advanced Materials (SAM) since 2016 and she has been fascinated by this fast growing industry ever since. If you have any particular topics of interest, or you have any questions, you can reach her at julissa@samaterials.com.

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About Us

Stanford Advanced Materials (SAM) Corporation is a global supplier of various sputtering targets such as metals, alloys, oxides, ceramic materials. It was first established in 1994 to begin supplying high-quality rare-earth products to assist our customers in the research and development (R&D) fields.

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