The preferred deposition methods are: RF sputtering, e-beam evaporation, or reactive pulse DC sputtering of the metal. Consult the SAM deposition table for information specific to a given material.
The preferred deposition methods are: RF sputtering, e-beam evaporation, or reactive pulse DC sputtering of the metal. Consult the SAM deposition table for information specific to a given material.
Stanford Advanced Materials (SAM) Corporation is a global supplier of various sputtering targets such as metals, alloys, oxides, ceramic materials. It was first established in 1994 to begin supplying high-quality rare-earth products to assist our customers in the research and development (R&D) fields.
| M | T | W | T | F | S | S |
|---|---|---|---|---|---|---|
| « Sep | ||||||
| 1 | 2 | 3 | 4 | 5 | ||
| 6 | 7 | 8 | 9 | 10 | 11 | 12 |
| 13 | 14 | 15 | 16 | 17 | 18 | 19 |
| 20 | 21 | 22 | 23 | 24 | 25 | 26 |
| 27 | 28 | 29 | 30 | 31 | ||
