The preferred deposition methods are: RF sputtering, e-beam evaporation, or reactive pulse DC sputtering of the metal. Consult the SAM deposition table for information specific to a given material.
The preferred deposition methods are: RF sputtering, e-beam evaporation, or reactive pulse DC sputtering of the metal. Consult the SAM deposition table for information specific to a given material.
Stanford Advanced Materials (SAM) Corporation is a global supplier of various sputtering targets such as metals, alloys, oxides, ceramic materials. It was first established in 1994 to begin supplying high-quality rare-earth products to assist our customers in the research and development (R&D) fields.
