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What is the preferred method for depositing indium tin oxide film?

Sputtering deposition is the preferred method for depositing ITO. Thermal or e-beam evaporation is possible, but difficult. Controlling the stoichiometry is much more challenging because the indium oxide and tin oxide will evaporate per their individual vapor pressures. Sputter delivers more successful results in terms of consistency and repeatability.

About the author

Julissa Green graduated from the University of Texas studying applied chemistry. She started her journalism life as a chemistry specialist in Stanford Advanced Materials (SAM) since 2016 and she has been fascinated by this fast growing industry ever since. If you have any particular topics of interest, or you have any questions, you can reach her at julissa@samaterials.com.

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Stanford Advanced Materials (SAM) Corporation is a global supplier of various sputtering targets such as metals, alloys, oxides, ceramic materials. It was first established in 1994 to begin supplying high-quality rare-earth products to assist our customers in the research and development (R&D) fields.

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