• Used in deposition processes including semiconductor deposition, chemical vapor deposition (CVD) and physical vapor deposition (PVD).
• Used for optics including wear protection, decorative coatings, and displays.
|Material Type||Titanium Oxide|
|Evaporation Temperature||1800 – 2000ºC|
|Evaporation Source||e-beam, Ta, W|
|Form||Available as a powder, granules, or tablets.|
High purity Titanium Oxide evaporation materials play a huge role in deposition processes to ensure high quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity aluminum evaporation materials using quality assurance processes to guarantee product reliability.
Our Titanium Oxide (Ti3O5) Evaporation Materials is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM specializes in producing high purity Titanium Oxide (Ti3O5) Evaporation Materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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The quality of these are great, and honestly I just adore the quality of SAM’s products.
At this point I am most definitely now a loyal SAM customer.