Our Vanadium (V) Rotary Sputtering Targets are fabricated from high-purity vanadium, a versatile transition metal valued for its unique optical, electronic, and hydrogen-absorbing properties. The rotary tubular design enables uniform, high-volume deposition of vanadium films, which are essential for advanced functional applications ranging from dynamic smart windows to cutting-edge superconducting devices.
| Product Code | ST11218 (Standard Reference) |
| Material | Vanadium (V) |
| Typical Purity | ≥ 99.0% (99.9% and higher grades available) |
| Form & Shape | Rotary Sputtering Target (Tubular) |
| Key Properties | Hydrogen Permeability | Metal-Insulator Transition | Superconductivity (Tc ≈ 5.4 K) |
| Key Advantage | Provides an efficient, uniform source for depositing vanadium-based films used in tunable optical coatings, hydrogen separation membranes, and as a critical component in multilayer superconducting devices. |
Key Advantage: The rotary design ensures high material utilization and consistent film properties over long deposition runs, which is crucial for cost-effective production of functional coatings and research on vanadium’s unique phase transitions.
Customization: Purity (99% to 99.99%), tubular dimensions (OD, ID, Length), and surface finish are fully customizable for specific cathode assemblies and process requirements.
Primary Applications: Thermochromic VOx films for smart windows; hydrogen purification and sensing layers; buffer and electrode layers in superconducting devices (e.g., A15 compounds); alloying component in protective coatings.
Detailed specifications for depositing functional vanadium films in research and industrial coating systems.
| Parameter | Specification / Details |
|---|---|
| Material | Vanadium (V) |
| Typical Purity | ≥ 99.0% (Standard), 99.9%, 99.99% available |
| Crystal Structure | Body-Centered Cubic (BCC) |
| Density | ~6.0 g/cm³ |
| Melting Point | 1890 °C (3434 °F) |
| Superconducting Transition (Tc) | ~5.4 K (For pure, bulk V) |
| Hydrogen Solubility | High – Forms vanadium hydrides (VHx) |
| Standard Shape | Tubular (Rotary Target) |
| Dimensions | Custom OD, ID, and Length |
| Surface Finish | Machined and cleaned for optimal sputtering performance |
| Bonding/Integration | Compatible with standard rotary cathode mounts; optional bonding to backing tubes |
| Manufacturing Method | Electron Beam Melting / Vacuum Arc Melting for high purity |
| Quality Documentation | Certificate of Analysis with purity verification (GDMS/OES available) |
Vanadium films deposited from these targets enable several advanced technologies:
As a sputtering source, vanadium is frequently used as an alloying component:
The rotary configuration is particularly beneficial for vanadium deposition:
Stanford Advanced Materials implements strict controls for vanadium target production:
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