Our Niobium Pentoxide (Nb₂O₅) Planar Sputtering Targets are engineered from high-purity, high-density ceramic material. Niobium oxide films are prized for their high refractive index, tunable optical properties, and dielectric characteristics, making them essential for cutting-edge applications in anti-reflective coatings, electrochromic devices, and high-k gate dielectrics.
| Material | Niobium Pentoxide (Nb₂O₅) |
| Material Class | High-Index, Wide Bandgap Oxide |
| Purity | ≥ 99.95% (on oxide basis) |
| Form | Planar Sputtering Target |
Key Advantage: High density and phase purity ensure stable RF sputtering of stoichiometric Nb₂O₅ films with consistent optical constants (n, k) and excellent dielectric properties, critical for multi-layer optical stacks and electronic devices.
Customization: Phase (amorphous, crystalline), density, dimensions (thickness, length, width), and bonding fully customizable.
Typical Applications: High-index layers in optical interference filters, electrochromic layers for smart windows, high-k dielectric layers in capacitors/transistors, and photocatalytic coatings.
For detailed evaluation and procurement (Standard Reference: ST11199).
| Parameter | Specification / Typical Value |
|---|---|
| Material | Niobium Pentoxide (Nb₂O₅) |
| Crystalline Phase | Typically amorphous as-deposited; can be crystallized to orthorhombic (T-Nb₂O₅) or others with annealing |
| Purity (Oxide Basis) | ≥ 99.95% |
| Density | ≥ 4.47 g/cm³ (Typically >95% T.D.) |
| Refractive Index (Film @ 550 nm) | ~2.2 – 2.4 (varies with deposition conditions) |
| Band Gap (Film) | ~3.2 – 4.0 eV (wide bandgap) |
| Dielectric Constant (κ) | ~40 – 120 (highly dependent on crystalline phase) |
| Standard Shape | Rectangular Planar |
| Dimensions | Fully Customizable |
| Sputtering Method | RF Magnetron (Primary), Pulsed-DC Reactive |
| Bonding Options | Bonding to Cu, Mo, or SS backing plate recommended for thermal management |
| Certification | Certificate of Analysis (CoA) with XRD phase data provided |
1. A Versatile Material for Light and Charge Control
Nb₂O₅’s value lies in its tunable properties:
Optical Coatings: Its high refractive index makes it an ideal high-index component in multi-layer anti-reflective (AR), high-reflective (HR), and bandpass filters for lasers, displays, and precision optics.
Electrochromics: Nb₂O₅ is an excellent ion storage layer in electrochromic devices (smart windows, dimmable mirrors). It provides high optical modulation, good ionic conductivity, and long-term cycling stability.
High-k Dielectrics: Certain crystalline phases of Nb₂O₅ (e.g., orthorhombic) exhibit a very high dielectric constant (κ), making it a candidate for high-density capacitors and gate dielectrics.
Photocatalysis: As a wide bandgap semiconductor, Nb₂O₅ films are investigated for photocatalytic water splitting and pollutant degradation under UV light.
2. The Critical Role of Target Density and Phase
The performance of sputtered Nb₂O₅ films is directly linked to the target’s quality:
High Density: Minimizes porosity, leading to dense, durable films with stable optical properties and reduced environmental degradation (e.g., moisture uptake).
Phase Control: The target’s phase influences the sputtering behavior and the as-deposited film’s structure. We can supply targets processed to promote specific crystalline phases or maintain an amorphous state for optimal film properties in your application.
3. Sputtering Considerations for Oxide Films
As an insulating ceramic, Nb₂O₅ requires RF sputtering or pulsed-DC reactive sputtering (from a Nb metal target). Our high-density ceramic targets are optimized for RF processes, providing stable impedance, minimal arcing, and high deposition rates of stoichiometric films.
We employ X-ray Diffraction (XRD) to confirm the phase composition of the ceramic target. Density is rigorously measured via the Archimedes method. For optical coating applications, we can provide spectroscopic ellipsometry data on witness samples sputtered under standard conditions to verify the refractive index (n) and extinction coefficient (k). This ensures the target will produce films with the expected optical performance.
Expertise in Optical & Functional Ceramics: We specialize in high-purity oxide targets where precise optical and electrical properties are paramount.
Process-Oriented Manufacturing: We tailor target properties (density, phase) to match your specific deposition process and application needs (optical, electronic, electrochromic).
Proven in Demanding Applications: Our targets are used in research and production of advanced optical filters, smart glass, and next-generation electronic devices.
Get a Formal Quote or Optical Property Data
To specify the optimal Nb₂O₅ target for your application, please provide:
Primary application (e.g., high-index optical layer, electrochromic ion storage, high-k dielectric).
Desired film properties (e.g., refractive index target, dielectric constant) or crystalline phase preference.
Target dimensions and bonding requirements.
