ST11192 Indium Tin Oxide (ITO) Rotary Sputtering Target

Complete Technical Specifications

For detailed evaluation and procurement (Standard Reference: ST11192).

Technical & Application Notes

1. The Dominant TCO for Optoelectronics
ITO remains the industry benchmark for transparent conductive films due to its optimal balance of high optical transmittance (>90% in visible spectrum) and low electrical resistivity (as low as 1-2 x 10⁻⁴ Ω·cm). The 90/10 composition offers the best trade-off between conductivity, etching characteristics, and cost for most display applications.

2. Why Density and Microstructure are Critical
For ITO targets, achieving high density (>95% of theoretical) is paramount. High density:

• Reduces Arcing: Minimizes micro-porosity that can cause electrical breakdown and damaging arcs.
• Improves Thermal Conductivity: Ensures efficient heat dissipation during high-power sputtering.
• Enhances Erosion Uniformity: Leads to stable, predictable deposition rates and extended target life.
• Reduces Particle Generation: Produces cleaner films with fewer defects, essential for high-yield display manufacturing.

3. Rotary Design: Engineered for Scale and Uniformity
In display fabs (Gen 6 to Gen 10.5), rotary targets are the undisputed standard for ITO deposition because they:

• Achieve Unmatched Uniformity: Critical for consistent electrical and optical properties across meter-sized glass substrates.
• Maximize Material Utilization: Up to 80% or more, a crucial economic factor given the high cost of indium.
• Enable High-Power, High-Rate Deposition: Essential for meeting the throughput demands of modern production lines.

4. Process Considerations
ITO is a ceramic material and is typically sputtered in a reduced-pressure argon-oxygen mixture. The exact gas ratio and power mode (DC, pulsed-DC) are tuned to achieve the desired film resistivity and stress without inducing target poisoning or arcing.

Quality Assurance

Our ITO targets are produced via hot pressing (HP) or sintering of high-purity oxide powders under controlled atmospheres. Each batch is characterized for:

• Chemical Composition: Verified via X-ray Fluorescence (XRF) or ICP.
• Density: Measured via Archimedes method.
• Microstructure: Examined by SEM to confirm fine grain size and absence of large pores.
• Electrical Performance: Film performance is often validated on test substrates to ensure compliance with industry resistivity and transmittance benchmarks.

Why Stanford Advanced Materials (SAM)

• Expertise in Ceramic TCOs: We master the complex powder processing and sintering required for high-performance ITO.
• Scale for Display Industry: We manufacture targets sized for all generations of display production lines.
• Focus on Process Stability: We prioritize density and homogeneity to ensure trouble-free operation in your high-availability production environment.

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Get a Formal Quote or Technical Datasheet
For production-scale ITO targets, please provide detailed specifications:

1. Desired composition (standard 90/10 or other) and target density requirement.
2. Rotary target dimensions (OD, ID, Length) or your coater generation/model.
3. Key film property targets (e.g., sheet resistance, transmittance).