Our Chromium Planar Sputtering Targets are engineered from high-purity chromium metal, providing a reliable and efficient source for depositing thin films renowned for their exceptional hardness, corrosion resistance, and aesthetic appeal in a wide range of industrial and decorative applications.
| Material | Chromium (Cr) |
| Purity | ≥ 99.95% (3N5) Standard |
| Form | Planar Sputtering Target |
| Shape | Rectangular (Standard) |
Key Advantage: High density and purity ensure stable DC sputtering of dense, adherent chromium films with excellent hardness and environmental durability.
Customization: Purity (99.5%, 99.95%, 99.99%), dimensions (thickness, length, width), and bonding fully customizable.
Typical Applications: Hard wear-resistant coatings (tools, molds), corrosion-resistant layers, decorative PVD finishes (hardware, automotive), and etch masks/photomasks.
For detailed evaluation and procurement (Standard Reference: ST11180).
| Parameter | Specification / Typical Value |
|---|---|
| Material | Chromium (Cr) |
| Purity (Standard) | ≥ 99.95% |
| Available Purity | 99.5%, 99.95%, 99.99% |
| Density | ≥ 7.15 g/cm³ (Theoretical: 7.19 g/cm³) |
| Crystal Structure | Body-Centered Cubic (BCC) |
| Hardness (Bulk) | ~1060 BHN |
| Standard Shape | Rectangular |
| Minimum Thickness | ≥ 1 mm (Customizable) |
| Electrical Resistivity | ~12.7 µΩ·cm (20°C) |
| Melting Point | 1857 °C |
| Thermal Conductivity | 94 W/(m·K) |
| Coeff. of Thermal Expansion | 4.9 x 10⁻⁶ /K |
| Sputtering Method | DC Magnetron (Primary) |
| Bonding Options | Indium, Elastomer, or brazing to Cu/SS backing plate |
| Certification | Certificate of Analysis (CoA) provided |
1. The Workhorse Material for Surface Engineering
Chromium is a cornerstone of physical vapor deposition (PVD) for surface enhancement. Its high melting point and body-centered cubic structure contribute to the deposition of films that are intrinsically hard, chemically inert, and resistant to oxidation. Compared to electroplated chromium, PVD chromium coatings are denser, more uniform, and environmentally friendly, without the use of hexavalent chromium.
2. Optimized for DC Sputtering Performance
Our targets are processed to achieve high density and a fine, uniform grain structure. This is critical for minimizing arcing—a common issue when sputtering refractory metals like chromium—and ensuring a smooth, stable deposition process with high material utilization and low particulate generation.
3. Application-Specific Guidance
Each Chromium Planar Target is subject to stringent inspection. Dimensional accuracy is verified with precision gauges. Density is measured via the Archimedes method. Chemical purity is confirmed by Glow Discharge Mass Spectrometry (GDMS) for higher grades, with results documented in the CoA. This ensures the target delivers consistent, high-performance results in your coating process.
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