| Chemical Formula | VO2 |
| Catalog No. | ST0920 |
| CAS Number | 12036-21-4 |
| Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
| Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
The Vanadium Dioxide Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers Vanadium Dioxide Sputtering Targets renowned for exceptional quality, all at highly competitive prices.
Vanadium Dioxide Sputtering Target is a specialized material used in the sputter deposition process. Sputter deposition is a technique employed in the production of thin films for various applications in electronics, optics, and coatings.
VO2 is known for exhibiting a unique property called the metal-insulator transition. At a specific temperature known as the transition temperature, VO2 undergoes a phase transition from an insulating state to a metallic state, accompanied by a change in its electrical conductivity.
Related Product: Vanadium Nitride Sputtering Target
| Compound Formula | VO2 |
| Molecular Weight | 82.94 |
| Appearance | Black Target |
| Melting Point | 1967℃ |
| Density (g/cm3) | 4.339 |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Vanadium Dioxide Sputtering Target is used for various applications in electronics, optics, and coatings.
Our Vanadium Dioxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Vanadium Dioxide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Submit your review | |
