| Chemical Formula | V2O3 |
| Catalog No. | ST0919 |
| CAS Number | 1314-34-7 |
| Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
| Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
The Vanadium Oxide Sputtering Target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers Vanadium Oxide Sputtering Targets renowned for exceptional quality, all at highly competitive prices.
Vanadium Oxide Sputtering Target is a specialized material used in the sputter deposition process. Sputter deposition is a technique employed in the production of thin films for various applications in electronics, optics, and coatings.
The sputtering target is a high-purity form of V2O3, designed to provide a controlled and precise source of vanadium(III) oxide during the thin-film deposition process.
Related Product: Vanadium Nitride Sputtering Target
| Compound Formula | V2O3 |
| Molecular Weight | 149.88 |
| Appearance | Black Target |
| Melting Point | 1940℃ |
| Density (g/cm3) | 4.339 |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Vanadium Oxide Sputtering Target is used in the fabrication of electronic devices and components.
Our Vanadium Oxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Vanadium Oxide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
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