| Chemical Formula | Fe/Cr/Ni |
| CAS Number | 65997-19-5 |
| Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
| Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
Our 316L Stainless Steel Sputtering Targets are engineered for superior performance in physical vapor deposition (PVD) processes. Known for their excellent corrosion resistance, good thermal conductivity, and high durability, these targets are ideal for depositing uniform, high-quality thin films in demanding applications across the semiconductor, optical, and aerospace industries.
316L stainless steel is an austenitic alloy known for its exceptional corrosion resistance, primarily due to its composition of iron, chromium, nickel, and molybdenum. The low carbon content (<0.03%) in the 316L grade minimizes carbide precipitation during high-temperature processes, making it particularly suitable for sputtering applications that require high purity and consistent performance.
The sputtering process involves bombarding the 316L target with high-energy ions in a vacuum chamber. This bombardment causes atoms from the target to be ejected and deposit onto a substrate, forming a thin, uniform film with the same superior composition and properties as the target material.
| Parameter | Specification |
|---|---|
| Material Type | 316L Stainless Steel |
| Primary Composition | Fe/Cr/Ni/Mo |
| Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
| Standard Available Sizes | Diameter: 1″, 2″, 3″, 4″, 5″, 6″, up to 20″ Thickness: 0.125″, 0.250″ |
| Theoretical Density | ~8.0 g/cm³ |
| Typical Applications | Decorative coatings, functional layers, research & development |
The use of our 316L Stainless Steel Sputtering Target allows for precise control over the deposition process, enabling the creation of thin films with excellent corrosion resistance and durability. These films are tailored for applications in:
Our Stainless Steel Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Stainless Steel Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
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For specific size, purity, or bonding requirements, please contact our technical sales team.
Submit your review | |
I recently purchased the 316L Stainless Steel Sputtering Target for my research on corrosion resistance. I specifically ordered the 4" size with a purity of 99.999%. The performance of the target was exceptional. The deposited thin films were uniform and of high quality. The target's excellent thermal conductivity and high durability were evident during the sputtering process. I am impressed with the product and highly recommend it.
Our company uses the 316L Stainless Steel Sputtering Target for creating functional layers in various industrial components. We ordered the 6" size with 99.9% purity. The product's performance has been excellent, contributing to the high-quality and durability of our components. Highly satisfied with the product.
