|Purity||99.9%, 99.95%, 99.99%, 99.995%, 99.999%|
|Shape||Discs, Plates, Column Targets, Step Targets, Custom-made|
The Lithium Oxide Sputtering Target is available in various forms, purities, and sizes. Stanford Advanced Materials (SAM) offers high-quality Lithium Oxide Sputtering Targets at the most competitive prices.
Lithium Oxide Sputtering Target is a specialized material used in the sputter deposition process, a technique employed to deposit thin films of material onto a substrate in a controlled and precise manner.
In the context of sputtering targets, Lithium Oxide Sputtering Targets are utilized to deposit thin films of lithium oxide onto surfaces. The sputtering process involves bombarding the target with high-energy ions, causing the ejection of atoms or molecules from the target material. These ejected particles then deposit onto a substrate, forming a thin film.
|Melting Point (℃)||1570|
|Boiling Point (℃)||N/A|
|Theoretical Density (g/cm3)||2.013|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Lithium Oxide Sputtering Target is suitable in battery technology, fuel cells, and as a component in certain ceramics and glasses.
Our Lithium Oxide Sputtering Targets are carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Lithium Oxide Sputtering Targets are available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.