Chemical Formula: Li2B4O7
Catalog Number: ST0874
CAS Number: 12007-60-2
Purity: 99.9% ~99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Lithium borate sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high quality lithium borate sputter targets at the most competitive price.
Lithium borate sputtering target is also known as lithium tetraborate sputter target. It is an inorganic compound with the formula Li2B4O7.
Lithium is a chemical element originated from the Greek ‘lithos’ meaning stone. It was first mentioned in 1817 and observed by A. Arfwedson. The isolation was later accomplished and announced by W. T. Brande. “Li” is the canonical chemical symbol of lithium. Its atomic number in the periodic table of elements is 3 with location at Period 2 and Group 1, belonging to the s-block. The relative atomic mass of lithium is 6.941(2) Dalton, the number in the brackets indicating the uncertainty. Related: Lithium Sputtering Target
Boron is a chemical element originated from the Arabic ‘buraq’, which was the name for borax. “B” is the canonical chemical symbol of boron. The abundance of Boron ranks third in the earth’s crust. The most important role of boron is to improve the hardenability of steel, so it can increase the hardenable size of steel, or improve the uniformity of microstructure and properties in the cross-section of steel after quenching and quenching. Related: Boron Sputtering Target
|Material Type||Lithium Borate|
|Melting Point||917 °C|
|Available Sizes||Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Our lithium borate sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
High quality lithium borate sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current prices of sputtering targets and other deposition materials that are not listed.
Submit your review
Amazing. Great product. Everything came out tight and clean. Love it and would definitely recommend it.