Material Type：Silicon (IV) Oxide
Color/Appearance：White, Crystalline Solid
Melting Point (°C)：1,610
Theoretical Density (g/cc)：~2.65
Thermal Evaporation Techniques：Crucible: Al2O3
E-Beam Crucible Liner Material：Fabmate®, Graphite, Tantalum
Temp. (°C) for Given Vap. Press. (Torr)：10-8: *
Comments：Quartz excellent in E-beam.
Purity：99.9% ~ 99.995%
Shape：Powder/ Granule/ Custom-made
Silicon dioxide has a melting point of 1,610°C, a density of 2.648 g/cc, and a vapor pressure of 10-4 Torr at 1,025°C. Silicon dioxide is commonly found in nature as sand or quartz. It is primarily used in the production of glass for windows and beverage bottles.
High purity evaporation materials play important role in deposition processes to ensure high quality deposited film. SAM specializes in producing up to 99.999% high purity evaporation materials using quality assurance processes to guarantee product reliability. The materials are used in deposition processes including semiconductor deposition, chemical vapor deposition (CVD) and physical vapor deposition (PVD)and mainly for optics including wear protection, decorative coatings, and displays.
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