Chemical Formula: Zr
Catalog Number: ST0409
CAS Number: 7440-67-7
Purity: 99.2%-99.95%
Thermal Conductivity: 22.7 W/m.K
Melting Point (°C): 1,852
Coefficient of Thermal Expansion: 5.7 x 10-6/K
Stanford Advanced Materials (SAM) offers high-purity rotatory zirconium (Zr) sputtering targets designed for high-throughput, large-area thin film deposition. Compared to planar targets, rotary sputtering targets offer higher material utilization, greater sputtering efficiency, and longer system uptime, making them ideal for semiconductor, optical, decorative, and solar coating applications.
Manufactured from premium zirconium with controlled grain structure and density, our rotatory targets ensure stable sputtering rates, excellent film uniformity, and minimal particle generation.
Related Product: Zirconium Sputtering Target
High Rotary Zr Target for Thin-film Application
| Parameter | Value |
|---|---|
| Material | Zirconium (Zr) |
| Purity | 99.2%, 99.5%, 99.9%, 99.95% |
| Melting Point | 1,852 °C |
| Thermal Conductivity | 22.7 W/m·K |
| Thermal Expansion Coefficient | 5.7 × 10⁻⁶ /K |
| Theoretical Density | 6.49 g/cm³ |
| Appearance | Silvery-white metallic |
| Outer Diameter (OD) | 3″ – 7″ |
| Inner Diameter (ID) | 2″ – 5.5″ |
| Length | Up to 138″ |
| Bonding | Optional (consult for options) |
Custom sizes and bonding configurations are available upon request.
Rotatory zirconium sputtering targets are widely used in:
Optical Coatings
High-index interference layers in AR coatings and filters
Semiconductor & Microelectronics
Diffusion barriers and adhesion layers
Photovoltaics
Back contacts and transparent conductive oxide interfaces
PVD Hard Coatings
Wear-resistant decorative and industrial surfaces
Fuel Cell & Energy Devices
Protective and catalytic films in energy conversion systems
Each rotatory target is individually sealed and foam-cushioned inside a moisture-controlled container. Products are labeled with traceable batch and material certifications. Full dimensional, chemical, and mechanical QC reports are available upon request.
SAM specializes in producing high purity rotatory zirconium sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Submit your review | |
We’ve been using SAM’s rotatory zirconium targets for over a year in our optical coating line. The target shows outstanding density and uniformity, resulting in very consistent film properties across large substrates. The high utilization rate has noticeably reduced our downtime between runs. Highly recommended for high-throughput vacuum systems.
I got exactly what I wanted to receive. Exact size as advertised. There are too many options of sizes. Will buy it again.
This works pretty well, handles everything within the given specification.
