Chemical Formula: Ti
CAS Number: 7440-32-6
Purity: 99.9%-99.999%
Our high-performance Rotatable Titanium Sputtering Target is available in various purities, sizes, and configurations. Stanford Advanced Materials (SAM) is your trusted one-stop source for high-quality titanium sputter targets.
Our rotatable titanium sputtering targets are manufactured from high-purity titanium, precision-engineered into cylindrical forms for superior performance in vacuum coating applications. They are designed for long-life, high-throughput deposition processes.
| Dimension | OD (Outer Diameter) | ID (Inner Diameter) | Length (L) |
| Range | 5.5”-7” | 5”-5.5” | <138” |
| Material Type | Titanium |
| Symbol | Ti |
| Color/Appearance | Silvery Metallic |
| Melting Point | 1,660°C |
| Theoretical Density | 4.5 g/cm³ |
Compared with planar targets, rotatory target contains more material and offer a greater utilization, which means longer production runs and reduced downtime of the system, increasing the throughput of the coating equipment. Besides, a rotary sputter target allows the use of higher power densities due to the heat build-up being spread evenly over the surface area of the target. As a consequence, an increased deposition speed can be seen along with an improved performance during reactive sputtering.
| Feature | Rotatable Titanium Target | Planar Titanium Target |
|---|---|---|
| Material Utilization | ≥80% | ~20-40% |
| Target Life | Very Long | Short |
| Thermal Management | Excellent | Limited |
| Power Density | High (e.g., 30-50 W/cm²) | Moderate (e.g., 10-20 W/cm²) |
| Process Stability | High | Variable |
| Cost-Efficiency | Higher initial cost, lower cost over time | Lower initial cost, higher operational cost |
| Ideal Application | High-throughput, continuous production of architectural glass, display coatings, and large-area functional films. | R&D, prototyping, and coating of small or complex-shaped substrates. |
Our rotatable titanium sputtering targets are meticulously packaged in sealed, vacuum-safe containers to prevent damage, oxidation, or contamination during storage and transportation, guaranteeing they arrive in pristine, ready-to-use condition.
SAM specializes in producing high-purity rotatable titanium sputtering targets with the highest achievable density and finest grain structure for applications in semiconductor manufacturing, chemical vapor deposition (CVD), physical vapor deposition (PVD), and optical coatings.
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